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005     20200423204352.0
024 7 _ |a 10.1021/nl0508624
|2 DOI
024 7 _ |a WOS:000230571300056
|2 WOS
024 7 _ |a 2128/2035
|2 Handle
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037 _ _ |a PreJuSER-52764
041 _ _ |a eng
082 _ _ |a 540
084 _ _ |2 WoS
|a Chemistry, Multidisciplinary
084 _ _ |2 WoS
|a Chemistry, Physical
084 _ _ |2 WoS
|a Nanoscience & Nanotechnology
084 _ _ |2 WoS
|a Materials Science, Multidisciplinary
084 _ _ |2 WoS
|a Physics, Applied
084 _ _ |2 WoS
|a Physics, Condensed Matter
100 1 _ |a Chen, Z.
|b 0
|0 P:(DE-HGF)0
245 _ _ |a The Role of Metal-Nanotube Contact in the Performance of Carbon Nanotube Field-Effect Transistors
260 _ _ |a Washington, DC
|b ACS Publ.
|c 2005
300 _ _ |a 1497 - 1502
336 7 _ |a Journal Article
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336 7 _ |a Journal Article
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336 7 _ |a ARTICLE
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336 7 _ |a JOURNAL_ARTICLE
|2 ORCID
336 7 _ |a article
|2 DRIVER
440 _ 0 |a Nano Letters
|x 1530-6984
|0 13841
|y 7
|v 5
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a Single-wall carbon nanotube field-effect transistors (CNFETs) have been shown to behave as Schottky barrier (SB) devices. It is not clear, however, what factors control the SB size. Here we present the first statistical analysis of this issue. We show that a large data set of more than 100 devices can be consistently accounted by a model that relates the on-current of a CNFET to a tunneling barrier whose height is determined by the nanotube diameter and the nature of the source/drain metal contacts. Our study permits identification of the desired combination of tube diameter and type of metal that provides the optimum performance of a CNFET.
536 _ _ |a Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
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588 _ _ |a Dataset connected to Web of Science
650 _ 7 |a J
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700 1 _ |a Appenzeller, J.
|b 1
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700 1 _ |a Knoch, J.
|b 2
|u FZJ
|0 P:(DE-Juel1)VDB56683
700 1 _ |a Lin, Y.
|b 3
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700 1 _ |a Avouris, P.
|b 4
|0 P:(DE-HGF)0
773 _ _ |a 10.1021/nl0508624
|g Vol. 5, p. 1497 - 1502
|p 1497 - 1502
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|0 PERI:(DE-600)2048866-X
|t Nano letters
|v 5
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|x 1530-6984
856 7 _ |u http://dx.doi.org/10.1021/nl0508624
|u http://hdl.handle.net/2128/2035
856 4 _ |u https://juser.fz-juelich.de/record/52764/files/82988.pdf
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913 1 _ |k I01
|v Materialien, Prozesse und Bauelemente für die Mikro- und Nanoelektronik
|l Informationstechnologie mit nanoelektronischen Systemen
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914 1 _ |a Nachtrag
|y 2005
915 _ _ |0 StatID:(DE-HGF)0010
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|0 StatID:(DE-HGF)0510
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920 1 _ |k ISG-1
|l Institut für Halbleiterschichten und Bauelemente
|d 31.12.2006
|g ISG
|0 I:(DE-Juel1)VDB41
|x 0
920 1 _ |k CNI
|l Center of Nanoelectronic Systems for Information Technology
|d 14.09.2008
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