guest ::
| Home > Publications database > Redox-based resistive switching memories - nanoionic mechanisms, prospects and challenges > print |
| Home > Publications database > Redox-based resistive switching memories - nanoionic mechanisms, prospects and challenges > print |
| 001 | 5316 | ||
| 005 | 20190625111849.0 | ||
| 024 | 7 | _ | |2 DOI |a 10.1002/adma.200900375 |
| 024 | 7 | _ | |2 WOS |a WOS:000268309100006 |
| 024 | 7 | _ | |a altmetric:1504958 |2 altmetric |
| 037 | _ | _ | |a PreJuSER-5316 |
| 041 | _ | _ | |a eng |
| 082 | _ | _ | |a 540 |
| 084 | _ | _ | |2 WoS |a Chemistry, Multidisciplinary |
| 084 | _ | _ | |2 WoS |a Chemistry, Physical |
| 084 | _ | _ | |2 WoS |a Nanoscience & Nanotechnology |
| 084 | _ | _ | |2 WoS |a Materials Science, Multidisciplinary |
| 084 | _ | _ | |2 WoS |a Physics, Applied |
| 084 | _ | _ | |2 WoS |a Physics, Condensed Matter |
| 100 | 1 | _ | |a Waser, R. |b 0 |u FZJ |0 P:(DE-Juel1)131022 |
| 245 | _ | _ | |a Redox-based resistive switching memories - nanoionic mechanisms, prospects and challenges |
| 260 | _ | _ | |a Weinheim |b Wiley-VCH |c 2009 |
| 300 | _ | _ | |a |
| 336 | 7 | _ | |a Journal Article |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
| 336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
| 336 | 7 | _ | |a ARTICLE |2 BibTeX |
| 336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
| 336 | 7 | _ | |a article |2 DRIVER |
| 440 | _ | 0 | |a Advanced Materials |x 0935-9648 |0 134 |y 25 |v 21 |
| 500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
| 520 | _ | _ | |a This review article introduces resistive switching processes that are being considered for nanoelectronic nonvolatile memories. The three main classes are based on an electrochemical metallization mechanism, a valence change mechanism, and a thermochemical mechanism, respectively. The current understanding of the microscopic mechanisms is discussed and the scaling potential is outlined. |
| 536 | _ | _ | |a Grundlagen für zukünftige Informationstechnologien |c P42 |2 G:(DE-HGF) |0 G:(DE-Juel1)FUEK412 |x 0 |
| 588 | _ | _ | |a Dataset connected to Web of Science |
| 650 | _ | 7 | |a J |2 WoSType |
| 700 | 1 | _ | |a Dittmann, R. |b 1 |u FZJ |0 P:(DE-Juel1)VDB5464 |
| 700 | 1 | _ | |a Staikov, G. |b 2 |u FZJ |0 P:(DE-Juel1)VDB13645 |
| 700 | 1 | _ | |a Szot, K. |b 3 |u FZJ |0 P:(DE-Juel1)VDB2799 |
| 773 | _ | _ | |a 10.1002/adma.200900375 |g Vol. 21 |q 21 |0 PERI:(DE-600)1474949-x |t Advanced materials |v 21 |y 2009 |x 0935-9648 |
| 856 | 7 | _ | |u http://dx.doi.org/10.1002/adma.200900375 |
| 909 | C | O | |o oai:juser.fz-juelich.de:5316 |p VDB |
| 913 | 1 | _ | |k P42 |v Grundlagen für zukünftige Informationstechnologien |l Grundlagen für zukünftige Informationstechnologien (FIT) |b Schlüsseltechnologien |0 G:(DE-Juel1)FUEK412 |x 0 |
| 914 | 1 | _ | |y 2009 |
| 915 | _ | _ | |0 StatID:(DE-HGF)0010 |a JCR/ISI refereed |
| 920 | 1 | _ | |d 31.12.2010 |g IFF |k IFF-6 |l Elektronische Materialien |0 I:(DE-Juel1)VDB786 |x 0 |
| 920 | 1 | _ | |0 I:(DE-82)080009_20140620 |k JARA-FIT |l Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology |g JARA |x 1 |
| 970 | _ | _ | |a VDB:(DE-Juel1)112685 |
| 980 | _ | _ | |a VDB |
| 980 | _ | _ | |a ConvertedRecord |
| 980 | _ | _ | |a journal |
| 980 | _ | _ | |a I:(DE-Juel1)PGI-7-20110106 |
| 980 | _ | _ | |a I:(DE-82)080009_20140620 |
| 980 | _ | _ | |a UNRESTRICTED |
| 981 | _ | _ | |a I:(DE-Juel1)PGI-7-20110106 |
| 981 | _ | _ | |a I:(DE-Juel1)VDB881 |
| Library | Collection | CLSMajor | CLSMinor | Language | Author |
|---|