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@ARTICLE{Watanabe:55458,
author = {Watanabe, T. and Hoffmann-Eifert, S. and Mi, S. and Jia, C.
and Waser, R.},
title = {{G}rowth of ternary {P}b{T}i{O}x films in a combination of
binary oxide atomic layer depositions},
journal = {Journal of applied physics},
volume = {101},
issn = {0021-8979},
address = {Melville, NY},
publisher = {American Institute of Physics},
reportid = {PreJuSER-55458},
pages = {014114},
year = {2007},
note = {Record converted from VDB: 12.11.2012},
abstract = {Ternary PbTiOx films were deposited at 240 degrees C on
Pt-covered Si substrates using a combination of liquid
injection atomic layer depositions of binary TiOx and PbO
films. Ti(OC3H7)(2)(C11H19O2)(2) [Ti(Oi-Pr)(2)(DPM)(2)] and
Pb(C11H19O2)(2) [Pb(DPM)(2)] dissolved in ethylcyclohexane
and H2O were used as source materials. The deposition rates
of Pb and Ti were enhanced in the ternary process compared
to their binary processes under comparable deposition
conditions. The Pb/Ti ratio of PbTiOx films saturated with
an increase in Ti precursor input, while it continued to
increase with an increasing Pb precursor input. The
self-regulated growth nature of the Pb-O layer in the binary
film growth was lost in the mixed PbTiOx process as a result
of interaction with the predeposited Ti-O layer. It was
confirmed that for the PbTiOx film to grow on Pt substrates,
an initial incubation period is required. Both Pb-O and Ti-O
layers shared a common incubation period of up to ten
sequences. The incubation period was shortened by increasing
the input of Pb precursor. It was independent of the input
of the Ti precursor and the order of precursor supply. This
variable incubation period was considered as a potential key
issue for growing stoichiometric and uniform multicomponent
films over three-dimensional (3D) structures. The order of
precursor supply affected the effective deposition rate
after the incubation period. A sequence starting with a Ti
precursor injection showed a higher growth rate than a
sequence that started with a Pb precursor supply. A PbTiOx
film was deposited on a 3D substrate precoated with an Ir
layer to demonstrate the uniformity in film thickness and
cation composition. Although the present PbTiOx process does
not have an ideal wide-process window in the cation
composition, the PbTiOx film showed uniform coverage and the
distribution of cation composition over the hole structure
was within +/- $10\%.$ (c) 2007 American Institute of
Physics.},
keywords = {J (WoSType)},
cin = {IFF-6 / CNI / IFF-8 / JARA-FIT},
ddc = {530},
cid = {I:(DE-Juel1)VDB786 / I:(DE-Juel1)VDB381 /
I:(DE-Juel1)VDB788 / $I:(DE-82)080009_20140620$},
pnm = {Grundlagen für zukünftige Informationstechnologien},
pid = {G:(DE-Juel1)FUEK412},
shelfmark = {Physics, Applied},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000243585200080},
doi = {10.1063/1.2422777},
url = {https://juser.fz-juelich.de/record/55458},
}