TY  - JOUR
AU  - Li, H.
AU  - Yu, G.
AU  - Teng, J.
AU  - Zhu, F.
TI  - Ultrathin high anisotropic magnetoresistance Ni0.81Fe0.19 films
JO  - Journal of physics / D
VL  - 39
SN  - 0022-3727
CY  - Bristol
PB  - IOP Publ.
M1  - PreJuSER-57068
SP  - 4915 - 4919
PY  - 2006
N1  - Record converted from VDB: 12.11.2012
AB  - We have fabricated an ultrathin high anisotropic magnetoresistance (AMR) Ni0.81Fe0.19 (10.0 nm) film grown on a (Ni0.81Fe0.19) Cr-0.63(0.37) (5.5 nm) underlayer with dc magnetron sputtering. The AMR value (Delta R/R) and the coercivity of the film attain 1.61(6)% and 178Am(-1) (i. e. 2.2 Oe), respectively. The Delta R/R of (Ni0.81Fe0.19)(0.63)Cr-0.37(5.5 nm)/ Ni0.81Fe0.19(10.0 nm) film has increased by similar to 34% over that of Ta(5.4 nm)/Ni0.81Fe0.19(10.0 nm) film (Delta R/R = 1.20(6)%) prepared using the same magnetron sputtering. The results of x-ray diffraction and atomic force microscopy show that the underlayer of (Ni0.81Fe0.19)(0.63)Cr-0.37 makes it easier to promote the formation of Ni0.81Fe0.19(111) texture and dramatically improves the crystalline grain size in the columnar direction and the average surface grain size of the Ni(0.81)Fe(0.19)film. The result of x-ray photoelectron spectroscopy shows that the (Ni0.81Fe0.19) Cr-0.63(0.37) underlayer, unlike the traditional Ta, does not react with the Ni0.81Fe0.19 film at the interface.
KW  - J (WoSType)
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000242650300003
DO  - DOI:10.1088/0022-3727/39/23/002
UR  - https://juser.fz-juelich.de/record/57068
ER  -