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000057341 0247_ $$2DOI$$a10.1166/jnn.2006.350
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000057341 084__ $$2WoS$$aChemistry, Multidisciplinary
000057341 084__ $$2WoS$$aNanoscience & Nanotechnology
000057341 084__ $$2WoS$$aMaterials Science, Multidisciplinary
000057341 084__ $$2WoS$$aPhysics, Applied
000057341 084__ $$2WoS$$aPhysics, Condensed Matter
000057341 1001_ $$0P:(DE-HGF)0$$aCziraki, P. L.$$b0
000057341 245__ $$aStructure and giant magnetoresistance behaviour of Co-Cu/Cu multilayers electrodeposited under various deposition conditions
000057341 260__ $$aStevenson Ranch, Calif.$$bAmerican Scientific Publ.$$c2006
000057341 300__ $$a2000 - 2012
000057341 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article
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000057341 440_0 $$017362$$aJournal of Nanoscience and Nanotechnology$$v6$$x1533-4880$$y7
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000057341 520__ $$aElectrodeposited Co-Cu/Cu multilayers were prepared under a variety of deposition conditions on either a polycrystalline Ti foil or on a silicon wafer covered by a Ta buffer and a Cu seed layer. X-ray diffraction (XRD)revealed a strong (111)texture for all multilayers with clear satellite peaks for the multilayers on Si/Ta/Cu substrates, in some cases for up to three reflections. Cross-sectional transmission electron microscopy investigations indicated a much more uniform multilayer structure on the Si/Ta/Cu substrates. The bilayer periods from XRD satellite reflections were in reasonable agreement with nominal values. An analysis of the overall chemical composition of the multilayers gave estimates of the sublayer thickness changes due to the Co-dissolution process during the Cu deposition pulse. The XRD lattice spacing data indicated a behaviour close to a simple "multilayer" Vegard's law which was, however, further refined by taking into account elastic strains as well. In agreement with the structural studies, magnetoresistance data also indicated the formation of more perfect multilayers on the smooth Si/Ta/Cu substrates. An analysis of the magnetoresistance behaviour revealed the presence of superparamagnetic (SPM)regions in the magnetic layers. The contribution of these SPM regions to the total observed giant magnetoresistance was found to be dominating under certain deposition conditions, e.g., for magnetic layer thicknesses less than 1 nm (about 5 monolayers). 
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000057341 65320 $$2Author$$aelectrodeposited multilayers
000057341 65320 $$2Author$$aXRD
000057341 65320 $$2Author$$aTEM
000057341 65320 $$2Author$$agiant magnetoresistance (GMR)
000057341 65320 $$2Author$$asuperparamagnetism (SPM)
000057341 650_7 $$00$$2NLM Chemicals$$aContrast Media
000057341 650_7 $$2WoSType$$aJ
000057341 7001_ $$0P:(DE-HGF)0$$aWeihnacht, V.$$b1
000057341 7001_ $$0P:(DE-HGF)0$$aToth, J.$$b2
000057341 7001_ $$0P:(DE-HGF)0$$aSimon, E.$$b3
000057341 7001_ $$0P:(DE-HGF)0$$aPadar, J.$$b4
000057341 7001_ $$0P:(DE-HGF)0$$aPogany, L.$$b5
000057341 7001_ $$0P:(DE-Juel1)130948$$aSchneider, C. M.$$b6$$uFZJ
000057341 7001_ $$0P:(DE-HGF)0$$aGemming, T.$$b7
000057341 7001_ $$0P:(DE-HGF)0$$aWetzig, K.$$b8
000057341 7001_ $$0P:(DE-HGF)0$$aTichy, G.$$b9
000057341 7001_ $$0P:(DE-HGF)0$$aBakonyi, I.$$b10
000057341 773__ $$0PERI:(DE-600)2060740-4$$a10.1166/jnn.2006.350$$gVol. 6, p. 2000 - 2012$$n7$$p2000 - 2012$$q6<2000 - 2012$$tJournal of nanoscience and nanotechnology$$v6$$x1533-4880$$y2006
000057341 8567_ $$2Pubmed Central$$uhttp://www.ncbi.nlm.nih.gov/pmc/articles/PMC2894639
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000057341 9141_ $$aNachtrag$$y2006
000057341 9131_ $$0G:(DE-Juel1)FUEK414$$bMaterie$$kP54$$lKondensierte Materie$$vKondensierte Materie$$x0$$zentfällt   bis 2009
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