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@ARTICLE{Cziraki:57341,
      author       = {Cziraki, P. L. and Weihnacht, V. and Toth, J. and Simon, E.
                      and Padar, J. and Pogany, L. and Schneider, C. M. and
                      Gemming, T. and Wetzig, K. and Tichy, G. and Bakonyi, I.},
      title        = {{S}tructure and giant magnetoresistance behaviour of
                      {C}o-{C}u/{C}u multilayers electrodeposited under various
                      deposition conditions},
      journal      = {Journal of nanoscience and nanotechnology},
      volume       = {6},
      number       = {7},
      issn         = {1533-4880},
      address      = {Stevenson Ranch, Calif.},
      publisher    = {American Scientific Publ.},
      reportid     = {PreJuSER-57341},
      pages        = {2000 - 2012},
      year         = {2006},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {Electrodeposited Co-Cu/Cu multilayers were prepared under a
                      variety of deposition conditions on either a polycrystalline
                      Ti foil or on a silicon wafer covered by a Ta buffer and a
                      Cu seed layer. X-ray diffraction (XRD)revealed a strong
                      (111)texture for all multilayers with clear satellite peaks
                      for the multilayers on Si/Ta/Cu substrates, in some cases
                      for up to three reflections. Cross-sectional transmission
                      electron microscopy investigations indicated a much more
                      uniform multilayer structure on the Si/Ta/Cu substrates. The
                      bilayer periods from XRD satellite reflections were in
                      reasonable agreement with nominal values. An analysis of the
                      overall chemical composition of the multilayers gave
                      estimates of the sublayer thickness changes due to the
                      Co-dissolution process during the Cu deposition pulse. The
                      XRD lattice spacing data indicated a behaviour close to a
                      simple "multilayer" Vegard's law which was, however, further
                      refined by taking into account elastic strains as well. In
                      agreement with the structural studies, magnetoresistance
                      data also indicated the formation of more perfect
                      multilayers on the smooth Si/Ta/Cu substrates. An analysis
                      of the magnetoresistance behaviour revealed the presence of
                      superparamagnetic (SPM)regions in the magnetic layers. The
                      contribution of these SPM regions to the total observed
                      giant magnetoresistance was found to be dominating under
                      certain deposition conditions, e.g., for magnetic layer
                      thicknesses less than 1 nm (about 5 monolayers).},
      keywords     = {Contrast Media (NLM Chemicals) / J (WoSType)},
      cin          = {IFF-IEE / JARA-FIT},
      ddc          = {540},
      cid          = {I:(DE-Juel1)VDB38 / $I:(DE-82)080009_20140620$},
      pnm          = {Kondensierte Materie},
      pid          = {G:(DE-Juel1)FUEK414},
      shelfmark    = {Chemistry, Multidisciplinary / Nanoscience $\&$
                      Nanotechnology / Materials Science, Multidisciplinary /
                      Physics, Applied / Physics, Condensed Matter},
      typ          = {PUB:(DE-HGF)16},
      pubmed       = {pmid:18421121},
      UT           = {WOS:000239542900016},
      doi          = {10.1166/jnn.2006.350},
      url          = {https://juser.fz-juelich.de/record/57341},
}