TY  - JOUR
AU  - Podgursky, V.
AU  - Adam, R.
AU  - Teske, M.
AU  - Krämer, M.
AU  - Franchy, R.
TI  - Contact-mode scanning tunneling microscopy experimental technique employed for tunneling magnetoresistance measurements
JO  - Review of scientific instruments
VL  - 77
SN  - 0034-6748
CY  - [S.l.]
PB  - American Institute of Physics
M1  - PreJuSER-57558
SP  - 033906
PY  - 2006
N1  - Record converted from VDB: 12.11.2012
AB  - We employed contact-mode scanning tunneling microscopy technique to perform systematic measurements of micrometer-sized Co/Al2O3/Co magnetic tunnel junctions (MTJs). Magnetic multilayer was grown by means of magnetron sputtering, followed by patterning of MTJ on top of FeMn antiferromagnetic bias layer into an array of rectangular mesa structures by standard photolithography. The maximum of 12.5% tunneling magnetoresistance at room temperature was measured for up to 40x40 mu m(2) test MTJs. (c) 2006 American Institute of Physics.
KW  - J (WoSType)
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000236739100028
DO  - DOI:10.1063/1.2185152
UR  - https://juser.fz-juelich.de/record/57558
ER  -