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@ARTICLE{Kluth:57655,
      author       = {Kluth, O. and Schöpe, G. and Rech, B. and Menner, R. and
                      Oertel, M. and Orgassa, K. and Schock, H. W.},
      title        = {{C}omparative material study on {RF} and {DC} magnetron
                      sputtered {Z}n{O}:{A}l films},
      journal      = {Thin solid films},
      volume       = {502},
      issn         = {0040-6090},
      address      = {Amsterdam [u.a.]},
      publisher    = {Elsevier},
      reportid     = {PreJuSER-57655},
      year         = {2006},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {ZnO:Al films were prepared on glass substrates by RF and DC
                      sputtering from ceramic ZnO:Al2O3 targets. The film
                      properties of RF sputtered ZnO:Al showed a weak dependence
                      on film thickness and substrate temperature while a strong
                      dependence on sputter pressure and oxygen addition to the
                      process gas was observed. For DC sputtering in static mode
                      at 270 degrees C a low resistivity of 2.3-5 x 10(-4) Omega
                      cm was obtained in a wide pressure range of 0.04 to 4 Pa. At
                      lower substrate temperatures the supply of small amounts of
                      oxygen was required to maintain high transparency and
                      achieve significant roughness for light scattering after wet
                      chemical etching. Highest damp heat stability was found for
                      ZnO:Al films deposited at low sputter pressures. This
                      behavior could be correlated to the highly compact film
                      structure of these films. ZnO:Al films deposited in dynamic
                      DC mode exhibited inferior resistivity of 8-40 x 10(-4)
                      Omega cm, which partly could be attributed to the specific
                      design of the inline sputter system. (c) 2005 Elsevier B.V.
                      All rights reserved.},
      keywords     = {J (WoSType)},
      cin          = {IPV},
      ddc          = {070},
      cid          = {I:(DE-Juel1)VDB46},
      pnm          = {Erneuerbare Energien},
      pid          = {G:(DE-Juel1)FUEK401},
      shelfmark    = {Materials Science, Multidisciplinary / Materials Science,
                      Coatings $\&$ Films / Physics, Applied / Physics, Condensed
                      Matter},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000236309200057},
      doi          = {10.1016/j.tsf.2005.07.313},
      url          = {https://juser.fz-juelich.de/record/57655},
}