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| Hauptseite > Publikationsdatenbank > Comparative material study on RF and DC magnetron sputtered ZnO:Al films > print |
| Hauptseite > Publikationsdatenbank > Comparative material study on RF and DC magnetron sputtered ZnO:Al films > print |
| 001 | 57655 | ||
| 005 | 20240708133624.0 | ||
| 024 | 7 | _ | |2 DOI |a 10.1016/j.tsf.2005.07.313 |
| 024 | 7 | _ | |2 WOS |a WOS:000236309200057 |
| 024 | 7 | _ | |a altmetric:21817430 |2 altmetric |
| 037 | _ | _ | |a PreJuSER-57655 |
| 041 | _ | _ | |a eng |
| 082 | _ | _ | |a 070 |
| 084 | _ | _ | |2 WoS |a Materials Science, Multidisciplinary |
| 084 | _ | _ | |2 WoS |a Materials Science, Coatings & Films |
| 084 | _ | _ | |2 WoS |a Physics, Applied |
| 084 | _ | _ | |2 WoS |a Physics, Condensed Matter |
| 100 | 1 | _ | |a Kluth, O. |b 0 |u FZJ |0 P:(DE-Juel1)VDB5913 |
| 245 | _ | _ | |a Comparative material study on RF and DC magnetron sputtered ZnO:Al films |
| 260 | _ | _ | |a Amsterdam [u.a.] |b Elsevier |c 2006 |
| 300 | _ | _ | |a |
| 336 | 7 | _ | |a Journal Article |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
| 336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
| 336 | 7 | _ | |a ARTICLE |2 BibTeX |
| 336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
| 336 | 7 | _ | |a article |2 DRIVER |
| 440 | _ | 0 | |a Thin Solid Films |x 0040-6090 |0 5762 |y 1 |v 502 |
| 500 | _ | _ | |a Record converted from VDB: 12.11.2012 |
| 520 | _ | _ | |a ZnO:Al films were prepared on glass substrates by RF and DC sputtering from ceramic ZnO:Al2O3 targets. The film properties of RF sputtered ZnO:Al showed a weak dependence on film thickness and substrate temperature while a strong dependence on sputter pressure and oxygen addition to the process gas was observed. For DC sputtering in static mode at 270 degrees C a low resistivity of 2.3-5 x 10(-4) Omega cm was obtained in a wide pressure range of 0.04 to 4 Pa. At lower substrate temperatures the supply of small amounts of oxygen was required to maintain high transparency and achieve significant roughness for light scattering after wet chemical etching. Highest damp heat stability was found for ZnO:Al films deposited at low sputter pressures. This behavior could be correlated to the highly compact film structure of these films. ZnO:Al films deposited in dynamic DC mode exhibited inferior resistivity of 8-40 x 10(-4) Omega cm, which partly could be attributed to the specific design of the inline sputter system. (c) 2005 Elsevier B.V. All rights reserved. |
| 536 | _ | _ | |a Erneuerbare Energien |c P11 |2 G:(DE-HGF) |0 G:(DE-Juel1)FUEK401 |x 0 |
| 588 | _ | _ | |a Dataset connected to Web of Science |
| 650 | _ | 7 | |a J |2 WoSType |
| 653 | 2 | 0 | |2 Author |a zinc oxide |
| 653 | 2 | 0 | |2 Author |a thin-film solar cells |
| 653 | 2 | 0 | |2 Author |a sputtering |
| 653 | 2 | 0 | |2 Author |a surface morphology |
| 700 | 1 | _ | |a Schöpe, G. |b 1 |u FZJ |0 P:(DE-Juel1)VDB5938 |
| 700 | 1 | _ | |a Rech, B. |b 2 |u FZJ |0 P:(DE-Juel1)VDB5941 |
| 700 | 1 | _ | |a Menner, R. |b 3 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Oertel, M. |b 4 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Orgassa, K. |b 5 |0 P:(DE-HGF)0 |
| 700 | 1 | _ | |a Schock, H. W. |b 6 |0 P:(DE-HGF)0 |
| 773 | _ | _ | |a 10.1016/j.tsf.2005.07.313 |g Vol. 502 |q 502 |0 PERI:(DE-600)1482896-0 |t Thin solid films |v 502 |y 2006 |x 0040-6090 |
| 856 | 7 | _ | |u http://dx.doi.org/10.1016/j.tsf.2005.07.313 |
| 909 | C | O | |o oai:juser.fz-juelich.de:57655 |p VDB |
| 913 | 1 | _ | |k P11 |v Erneuerbare Energien |l Erneuerbare Energien |b Energie |0 G:(DE-Juel1)FUEK401 |x 0 |
| 914 | 1 | _ | |a Nachtrag |y 2006 |
| 915 | _ | _ | |0 StatID:(DE-HGF)0010 |a JCR/ISI refereed |
| 920 | 1 | _ | |k IPV |l Institut für Photovoltaik |d 31.12.2006 |g IPV |0 I:(DE-Juel1)VDB46 |x 1 |
| 970 | _ | _ | |a VDB:(DE-Juel1)90687 |
| 980 | _ | _ | |a VDB |
| 980 | _ | _ | |a ConvertedRecord |
| 980 | _ | _ | |a journal |
| 980 | _ | _ | |a I:(DE-Juel1)IEK-5-20101013 |
| 980 | _ | _ | |a UNRESTRICTED |
| 981 | _ | _ | |a I:(DE-Juel1)IMD-3-20101013 |
| 981 | _ | _ | |a I:(DE-Juel1)IEK-5-20101013 |
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