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@ARTICLE{Halder:58028,
      author       = {Halder, S. and Schneller, T. and Waser, R.},
      title        = {{E}nhanced stability of platinized silicon substrates using
                      an unconventional adhesion layer deposited by {CSD} for high
                      temperature dielectric thin film deposition},
      journal      = {Applied physics / A},
      volume       = {87},
      issn         = {0947-8396},
      address      = {Berlin},
      publisher    = {Springer},
      reportid     = {PreJuSER-58028},
      pages        = {705 - 708},
      year         = {2007},
      note         = {Record converted from VDB: 12.11.2012},
      abstract     = {Almost all platinized substrates manufactured presently use
                      an TiO2 adhesion layer to improve the adhesion between the
                      SiO2 and the Pt. These substrates however are stable till
                      only 800 degrees C. We show that simply by replacing the
                      TiO2 with Al2O3, the stability of the electrodes can be
                      increased to 1000 degrees C and more. These substrates can
                      be used for high temperature depositions which standard
                      platinized substrates cannot withstand. Further we show that
                      dielectric thin films of BaTiO3 and (Ba,Sr)TiO3 crystallized
                      at higher temperatures show almost a threefold increase in
                      permittivity on these high temperature stable platinized
                      silicon substrates.The large increase in permittivity is
                      attributed to an increase in grain size at high
                      temperatures.},
      keywords     = {J (WoSType)},
      cin          = {IFF-6 / CNI / JARA-FIT},
      ddc          = {530},
      cid          = {I:(DE-Juel1)VDB786 / I:(DE-Juel1)VDB381 /
                      $I:(DE-82)080009_20140620$},
      pnm          = {Grundlagen für zukünftige Informationstechnologien},
      pid          = {G:(DE-Juel1)FUEK412},
      shelfmark    = {Materials Science, Multidisciplinary / Physics, Applied},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000245964300019},
      doi          = {10.1007/s00339-007-3866-3},
      url          = {https://juser.fz-juelich.de/record/58028},
}