001     58039
005     20180211175741.0
024 7 _ |2 DOI
|a 10.1080/10584580500312644
024 7 _ |2 WOS
|a WOS:000233872900005
037 _ _ |a PreJuSER-58039
041 _ _ |a eng
082 _ _ |a 620
084 _ _ |2 WoS
|a Engineering, Electrical & Electronic
084 _ _ |2 WoS
|a Physics, Applied
084 _ _ |2 WoS
|a Physics, Condensed Matter
100 1 _ |a Mustafa, Y.
|b 0
|u FZJ
|0 P:(DE-Juel1)VDB70200
245 _ _ |a A dynamic reference scheme for nonvolatile ferroelectric RAM
260 _ _ |a London [u.a.]
|b Taylor & Francis
|c 2005
300 _ _ |a 31 - 37
336 7 _ |a Journal Article
|0 PUB:(DE-HGF)16
|2 PUB:(DE-HGF)
336 7 _ |a Output Types/Journal article
|2 DataCite
336 7 _ |a Journal Article
|0 0
|2 EndNote
336 7 _ |a ARTICLE
|2 BibTeX
336 7 _ |a JOURNAL_ARTICLE
|2 ORCID
336 7 _ |a article
|2 DRIVER
440 _ 0 |a Integrated Ferroelectrics
|x 1058-4587
|0 2659
|v 72
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a We report on a novel reference voltage scheme for FRAMs which solves most problems like fatigue, temperature dependency, voltage drop, etc still present in other reference schemes: dynamic reference scheme. It tracks the variations of the ferroelectric capacitors in the memory and provides a common reference voltage line for all sense amplifiers on chip or different reference voltages for different memory banks. No dedicated reference cells are required, instead the memory cells themselves are utilized to generate the reference voltage by periodical test of their voltage levels or by setting a signal that starts the test. This scheme extends life-time and reliability of the memory and enables a self test and repair capability.
536 _ _ |a Grundlagen für zukünftige Informationstechnologien
|c P42
|2 G:(DE-HGF)
|0 G:(DE-Juel1)FUEK412
|x 0
588 _ _ |a Dataset connected to Web of Science
650 _ 7 |a J
|2 WoSType
653 2 0 |2 Author
|a dynamic reference voltage
653 2 0 |2 Author
|a non destructive
653 2 0 |2 Author
|a FRAM
653 2 0 |2 Author
|a calibration
700 1 _ |a Rickes, J. T.
|b 1
|u FZJ
|0 P:(DE-Juel1)VDB3114
700 1 _ |a Waser, R.
|b 2
|u FZJ
|0 P:(DE-Juel1)131022
700 1 _ |a McAdams, H.P.
|b 3
|0 P:(DE-HGF)0
773 _ _ |a 10.1080/10584580500312644
|g Vol. 72, p. 31 - 37
|p 31 - 37
|q 72<31 - 37
|0 PERI:(DE-600)2037916-X
|t Integrated ferroelectrics
|v 72
|y 2005
|x 1058-4587
856 7 _ |u http://dx.doi.org/10.1080/10584580500312644
909 C O |o oai:juser.fz-juelich.de:58039
|p VDB
913 1 _ |k P42
|v Grundlagen für zukünftige Informationstechnologien
|l Grundlagen für zukünftige Informationstechnologien (FIT)
|b Schlüsseltechnologien
|0 G:(DE-Juel1)FUEK412
|x 0
914 1 _ |a Nachtrag
|y 2005
915 _ _ |0 StatID:(DE-HGF)0010
|a JCR/ISI refereed
920 1 _ |k IFF-IEM
|l Elektronische Materialien
|d 31.12.2006
|g IFF
|0 I:(DE-Juel1)VDB321
|x 0
920 1 _ |k CNI
|l Center of Nanoelectronic Systems for Information Technology
|d 14.09.2008
|g CNI
|z 381
|0 I:(DE-Juel1)VDB381
|x 1
970 _ _ |a VDB:(DE-Juel1)91216
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980 _ _ |a journal
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980 _ _ |a I:(DE-Juel1)VDB381
980 _ _ |a UNRESTRICTED
981 _ _ |a I:(DE-Juel1)PGI-7-20110106
981 _ _ |a I:(DE-Juel1)VDB381


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