001     58103
005     20200423204515.0
024 7 _ |a 10.1063/1.2772191
|2 DOI
024 7 _ |a WOS:000248984800096
|2 WOS
024 7 _ |a 2128/17994
|2 Handle
037 _ _ |a PreJuSER-58103
041 _ _ |a eng
082 _ _ |a 530
084 _ _ |2 WoS
|a Physics, Applied
100 1 _ |a Kever, T.
|b 0
|0 P:(DE-HGF)0
245 _ _ |a On the origin of bistable resistive switching in metal organic charge transfer complex memory cells
260 _ _ |a Melville, NY
|b American Institute of Physics
|c 2007
300 _ _ |a 083506
336 7 _ |a Journal Article
|0 PUB:(DE-HGF)16
|2 PUB:(DE-HGF)
336 7 _ |a Output Types/Journal article
|2 DataCite
336 7 _ |a Journal Article
|0 0
|2 EndNote
336 7 _ |a ARTICLE
|2 BibTeX
336 7 _ |a JOURNAL_ARTICLE
|2 ORCID
336 7 _ |a article
|2 DRIVER
440 _ 0 |a Applied Physics Letters
|x 0003-6951
|0 562
|v 91
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a Electrical characteristics of Cu:tetracyanoquinodimethane (TCNQ) devices with different electrodes were studied. The comparison of impedance spectroscopic measurements on devices with Al and Pt top electrodes proved the existence of a high resistive interface layer between Cu:TCNQ and Al. An equivalent circuit was modeled and the resulting values suggest that the interface layer is composed of naturally formed aluminum oxide. Devices with deliberately formed aluminum oxide and without Cu:TCNQ were fabricated and revealed a similar behavior. The authors propose that the switching effect in Cu:TCNQ thin film devices is a Cu ion based electrochemical effect occurring in a thin aluminum oxide layer. (C) 2007 American Institute of Physics.
536 _ _ |a Grundlagen für zukünftige Informationstechnologien
|c P42
|2 G:(DE-HGF)
|0 G:(DE-Juel1)FUEK412
|x 0
588 _ _ |a Dataset connected to Web of Science
650 _ 7 |a J
|2 WoSType
700 1 _ |a Böttger, U.
|b 1
|0 P:(DE-HGF)0
700 1 _ |a Schindler, C.
|b 2
|u FZJ
|0 P:(DE-Juel1)VDB61376
700 1 _ |a Waser, R.
|b 3
|u FZJ
|0 P:(DE-Juel1)131022
773 _ _ |a 10.1063/1.2772191
|g Vol. 91, p. 083506
|p 083506
|q 91<083506
|0 PERI:(DE-600)1469436-0
|t Applied physics letters
|v 91
|y 2007
|x 0003-6951
856 7 _ |u http://dx.doi.org/10.1063/1.2772191
856 4 _ |u https://juser.fz-juelich.de/record/58103/files/1.2772191.pdf
|y OpenAccess
856 4 _ |u https://juser.fz-juelich.de/record/58103/files/1.2772191.gif?subformat=icon
|x icon
|y OpenAccess
856 4 _ |u https://juser.fz-juelich.de/record/58103/files/1.2772191.jpg?subformat=icon-180
|x icon-180
|y OpenAccess
856 4 _ |u https://juser.fz-juelich.de/record/58103/files/1.2772191.jpg?subformat=icon-700
|x icon-700
|y OpenAccess
856 4 _ |u https://juser.fz-juelich.de/record/58103/files/1.2772191.pdf?subformat=pdfa
|x pdfa
|y OpenAccess
909 C O |o oai:juser.fz-juelich.de:58103
|p openaire
|p open_access
|p VDB
|p driver
|p dnbdelivery
913 1 _ |k P42
|v Grundlagen für zukünftige Informationstechnologien
|l Grundlagen für zukünftige Informationstechnologien (FIT)
|b Schlüsseltechnologien
|0 G:(DE-Juel1)FUEK412
|x 0
914 1 _ |y 2007
915 _ _ |a OpenAccess
|0 StatID:(DE-HGF)0510
|2 StatID
915 _ _ |a JCR/ISI refereed
|0 StatID:(DE-HGF)0010
920 1 _ |d 31.12.2010
|g IFF
|k IFF-6
|l Elektronische Materialien
|0 I:(DE-Juel1)VDB786
|x 0
920 1 _ |d 14.09.2008
|g CNI
|k CNI
|l Center of Nanoelectronic Systems for Information Technology
|0 I:(DE-Juel1)VDB381
|x 1
|z 381
920 1 _ |0 I:(DE-82)080009_20140620
|k JARA-FIT
|l Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology
|g JARA
|x 2
970 _ _ |a VDB:(DE-Juel1)91319
980 _ _ |a VDB
980 _ _ |a ConvertedRecord
980 _ _ |a journal
980 _ _ |a I:(DE-Juel1)PGI-7-20110106
980 _ _ |a I:(DE-Juel1)VDB381
980 _ _ |a I:(DE-82)080009_20140620
980 _ _ |a UNRESTRICTED
980 1 _ |a FullTexts
981 _ _ |a I:(DE-Juel1)PGI-7-20110106
981 _ _ |a I:(DE-Juel1)VDB381
981 _ _ |a I:(DE-Juel1)VDB881


LibraryCollectionCLSMajorCLSMinorLanguageAuthor
Marc 21