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024 7 _ |2 DOI
|a 10.1109/TED.2007.904402
024 7 _ |2 WOS
|a WOS:000249904100025
024 7 _ |a altmetric:21817704
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037 _ _ |a PreJuSER-58289
041 _ _ |a eng
084 _ _ |2 WoS
|a Engineering, Electrical & Electronic
084 _ _ |2 WoS
|a Physics, Applied
100 1 _ |0 P:(DE-Juel1)VDB61376
|a Schindler, C.
|b 0
|u FZJ
245 _ _ |a Bipolar and unipolar resistive switching in Cu-doped SiO2
260 _ _ |c 2007
300 _ _ |a 2762
336 7 _ |0 PUB:(DE-HGF)16
|2 PUB:(DE-HGF)
|a Journal Article
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|a Journal Article
336 7 _ |2 BibTeX
|a ARTICLE
336 7 _ |2 ORCID
|a JOURNAL_ARTICLE
336 7 _ |2 DRIVER
|a article
440 _ 0 |0 2508
|a IEEE Transactions on Electron Devices
|v 54
|x 0018-9383
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a Scalable nonvolatile memory devices that operate at low voltage and current, exhibit multilevel cell capability, and can be read nondestructively using simple circuitry, are highly sought after. Such devices are of particular interest if they are compatible with back-end-of-line processing for CMOS integrated circuits. A variety of resistance-change technologies show promise in this respect, but a new approach that is based on switching in copper-doped silicon dioxide may be the simplest and least expensive to integrate. This paper describes the characteristics Of W-(Cu/SiO2)-Cu programmable metallization cell (PMC) devices formed by the thermal diffusion of Cu into deposited SiO2 PMC devices operate by the electrochemical control of metallic pathways in solid electrolytes. Both unipolar and bipolar resistive switching could be attained in these devices. Bipolar switching, which is identical to that seen in PMC devices based On other solid electrolytes, was observed for low bias (a few tenths of volts) and programming currents in the microampere range. The resistance ratio between high and low states was on the order of 10(3), and a multibit storage is considered possible via the strong dependence of ON-state resistance on programming current. The low and high resistance states were stable for more than 5 x 10(4) s. The devices could be made to exhibit unipolar switching using a negative bias on the order of -1V combined with erase currents of hundreds of microampere to a few milliampere. In this case, the OFF/ON ratio was 10(6).
536 _ _ |0 G:(DE-Juel1)FUEK412
|2 G:(DE-HGF)
|a Grundlagen für zukünftige Informationstechnologien
|c P42
|x 0
588 _ _ |a Dataset connected to Web of Science
650 _ 7 |2 WoSType
|a J
653 2 0 |2 Author
|a electrical switching
653 2 0 |2 Author
|a nonvolatile memory
653 2 0 |2 Author
|a silicon oxide
653 2 0 |2 Author
|a solid electrolytes
700 1 _ |0 P:(DE-Juel1)VDB70639
|a Thermada, S.C.P.
|b 1
|u FZJ
700 1 _ |0 P:(DE-Juel1)131022
|a Waser, R.
|b 2
|u FZJ
700 1 _ |0 P:(DE-Juel1)VDB70640
|a Kozicki, M.N.
|b 3
|u FZJ
773 _ _ |0 PERI:(DE-600)2028088-9
|a 10.1109/TED.2007.904402
|g Vol. 54, p. 2762
|p 2762
|q 54<2762
|t IEEE Transactions on Electron Devices
|v 54
|x 0018-9383
|y 2007
856 7 _ |u http://dx.doi.org/10.1109/TED.2007.904402
909 C O |o oai:juser.fz-juelich.de:58289
|p VDB
913 1 _ |0 G:(DE-Juel1)FUEK412
|b Schlüsseltechnologien
|k P42
|l Grundlagen für zukünftige Informationstechnologien (FIT)
|v Grundlagen für zukünftige Informationstechnologien
|x 0
914 1 _ |y 2007
920 1 _ |0 I:(DE-Juel1)VDB786
|d 31.12.2010
|g IFF
|k IFF-6
|l Elektronische Materialien
|x 0
920 1 _ |0 I:(DE-Juel1)VDB381
|d 14.09.2008
|g CNI
|k CNI
|l Center of Nanoelectronic Systems for Information Technology
|x 1
|z 381
920 1 _ |0 I:(DE-82)080009_20140620
|g JARA
|k JARA-FIT
|l Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology
|x 2
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980 _ _ |a I:(DE-Juel1)VDB381
980 _ _ |a I:(DE-82)080009_20140620
980 _ _ |a UNRESTRICTED
981 _ _ |a I:(DE-Juel1)PGI-7-20110106
981 _ _ |a I:(DE-Juel1)VDB381
981 _ _ |a I:(DE-Juel1)VDB881


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