000058707 001__ 58707
000058707 005__ 20180211182950.0
000058707 0247_ $$2DOI$$a10.1016/j.susc.2007.04.031
000058707 0247_ $$2WOS$$aWOS:000250414600044
000058707 037__ $$aPreJuSER-58707
000058707 041__ $$aeng
000058707 082__ $$a540
000058707 084__ $$2WoS$$aChemistry, Physical
000058707 084__ $$2WoS$$aPhysics, Condensed Matter
000058707 1001_ $$0P:(DE-Juel1)VDB9869$$aFilimonov, S. N.$$b0$$uFZJ
000058707 245__ $$aSi nucleation on Si(111)-7x7: from cluster pairs to 2D islands
000058707 260__ $$aAmsterdam$$bElsevier$$c2007
000058707 300__ $$a3876 - 3880
000058707 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article
000058707 3367_ $$2DataCite$$aOutput Types/Journal article
000058707 3367_ $$00$$2EndNote$$aJournal Article
000058707 3367_ $$2BibTeX$$aARTICLE
000058707 3367_ $$2ORCID$$aJOURNAL_ARTICLE
000058707 3367_ $$2DRIVER$$aarticle
000058707 440_0 $$05673$$aSurface Science$$v601$$x0039-6028
000058707 500__ $$aRecord converted from VDB: 12.11.2012
000058707 520__ $$aNucleation of 2D islands in Si/Si(111)-7 x 7 molecular beam epitaxy is studied using scanning tunneling microscopy (STM). A detailed analysis of the population of small amorphous clusters coexisting on the surface with epitaxial 2D islands has been performed. It is shown that small clusters tend to form pairs. The pairs serve as precursors for 2D islands as confirmed by direct STM observations of the smallest 2D islands covering two adjacent half-unit cells of the 7 x 7 reconstruction. it is proved with scaling arguments that the critical nucleus for 2D island formation consists not only of the pair itself, but also includes additional adatoms not belonging to the stable clusters. (C) 2007 Elsevier B.V. All rights reserved.
000058707 536__ $$0G:(DE-Juel1)FUEK412$$2G:(DE-HGF)$$aGrundlagen für zukünftige Informationstechnologien$$cP42$$x0
000058707 588__ $$aDataset connected to Web of Science
000058707 650_7 $$2WoSType$$aJ
000058707 65320 $$2Author$$amolecular beam epitaxy
000058707 65320 $$2Author$$ascanning tunneling microscopy
000058707 65320 $$2Author$$anucleation
000058707 65320 $$2Author$$asurface diffusion
000058707 65320 $$2Author$$asilicon
000058707 7001_ $$0P:(DE-Juel1)VDB10516$$aCherepanov, V.$$b1$$uFZJ
000058707 7001_ $$0P:(DE-HGF)0$$aHervieu, Yu. Yu.$$b2
000058707 7001_ $$0P:(DE-Juel1)VDB5601$$aVoigtländer, B.$$b3$$uFZJ
000058707 773__ $$0PERI:(DE-600)1479030-0$$a10.1016/j.susc.2007.04.031$$gVol. 601, p. 3876 - 3880$$p3876 - 3880$$q601<3876 - 3880$$tSurface science$$v601$$x0039-6028$$y2007
000058707 8567_ $$uhttp://dx.doi.org/10.1016/j.susc.2007.04.031
000058707 909CO $$ooai:juser.fz-juelich.de:58707$$pVDB
000058707 9131_ $$0G:(DE-Juel1)FUEK412$$bSchlüsseltechnologien$$kP42$$lGrundlagen für zukünftige Informationstechnologien (FIT)$$vGrundlagen für zukünftige Informationstechnologien$$x0
000058707 9141_ $$y2007
000058707 915__ $$0StatID:(DE-HGF)0010$$aJCR/ISI refereed
000058707 9201_ $$0I:(DE-Juel1)VDB801$$d31.12.2010$$gIBN$$kIBN-3$$lGrenz- und Oberflächen$$x0
000058707 9201_ $$0I:(DE-Juel1)VDB381$$d14.09.2008$$gCNI$$kCNI$$lCenter of Nanoelectronic Systems for Information Technology$$x1$$z381
000058707 9201_ $$0I:(DE-82)080009_20140620$$gJARA$$kJARA-FIT$$lJülich-Aachen Research Alliance - Fundamentals of Future Information Technology$$x2
000058707 970__ $$aVDB:(DE-Juel1)92496
000058707 980__ $$aVDB
000058707 980__ $$aConvertedRecord
000058707 980__ $$ajournal
000058707 980__ $$aI:(DE-Juel1)PGI-3-20110106
000058707 980__ $$aI:(DE-Juel1)VDB381
000058707 980__ $$aI:(DE-82)080009_20140620
000058707 980__ $$aUNRESTRICTED
000058707 981__ $$aI:(DE-Juel1)PGI-3-20110106
000058707 981__ $$aI:(DE-Juel1)VDB381
000058707 981__ $$aI:(DE-Juel1)VDB881