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@ARTICLE{Emtsev:59152,
author = {Emtsev, V. V. and Ehrhart, P. and Poloskin, D. S. and
Emtsev, K. V.},
title = {{C}omparative studies of defect production in heavily doped
silicon under fast electron irradiation at different
temperatures},
journal = {Journal of materials science / Materials in electronics},
volume = {18},
issn = {0957-4522},
address = {Dordrecht [u.a.]},
publisher = {Springer Science + Business Media B.V},
reportid = {PreJuSER-59152},
pages = {711 - 714},
year = {2007},
note = {Record converted from VDB: 12.11.2012},
abstract = {Production processes of electrically active defects in
degenerate silicon subjected to 2.5 MeV electron irradiation
at T = 4.2 K and T = 300 K have been studied. The production
rates of primary and secondary defects in irradiated samples
are analyzed on the basis of the known properties of
radiation-produced defects in Si. It has been demonstrated
that a striking difference in the production rates of
electrically active defects in n- and p-Si under irradiation
at cryogenic temperatures may be related to the different
fate of Frenkel pairs in both materials. The production rate
of primary defects in degenerate Si was found to be between
1.5 cm(-1) and 2 cm(-1).},
keywords = {J (WoSType)},
cin = {IFF-6},
ddc = {600},
cid = {I:(DE-Juel1)VDB786},
pnm = {Kondensierte Materie},
pid = {G:(DE-Juel1)FUEK414},
shelfmark = {Engineering, Electrical $\&$ Electronic / Materials
Science, Multidisciplinary / Physics, Applied / Physics,
Condensed Matter},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000246175200007},
doi = {10.1007/s10854-006-9103-6},
url = {https://juser.fz-juelich.de/record/59152},
}