000059454 001__ 59454
000059454 005__ 20180211162531.0
000059454 0247_ $$2DOI$$a10.1016/j.susc.2007.06.003
000059454 0247_ $$2WOS$$aWOS:000249282600007
000059454 037__ $$aPreJuSER-59454
000059454 041__ $$aeng
000059454 082__ $$a540
000059454 084__ $$2WoS$$aChemistry, Physical
000059454 084__ $$2WoS$$aPhysics, Condensed Matter
000059454 1001_ $$0P:(DE-HGF)0$$aPodgurski, V.$$b0
000059454 245__ $$aStudy of phase transitions within alumina grown on top of CoAl (1 0 0) surface
000059454 260__ $$aAmsterdam$$bElsevier$$c2007
000059454 300__ $$a3315 - 3323
000059454 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article
000059454 3367_ $$2DataCite$$aOutput Types/Journal article
000059454 3367_ $$00$$2EndNote$$aJournal Article
000059454 3367_ $$2BibTeX$$aARTICLE
000059454 3367_ $$2ORCID$$aJOURNAL_ARTICLE
000059454 3367_ $$2DRIVER$$aarticle
000059454 440_0 $$05673$$aSurface Science$$v601$$x0039-6028$$y16
000059454 500__ $$aRecord converted from VDB: 12.11.2012
000059454 520__ $$aThe oxidation of CoAl(100) was investigated by means of Auger electron spectroscopy (AES), low energy electron diffraction (LEED), high resolution electron energy loss spectroscopy (HREELS), and scanning tunneling microscopy (STM). In the case of alumina grown after oxidation with 15,000 L at room temperature, the characteristic EEL spectrum, along with the sharp (2 x 1) LEED pattern observed after annealing at 1000 K, showed that a stable well-ordered theta alumina was formed. The intermediate phase was found after heat treatment at H 50 K. At higher temperatures, the formation of the alpha-like alumina was observed. The comparative study of as-oxidation versus subsequent annealing of amorphous alumina at high-temperatures revealed a close similarity between the structures of alumina. (C) 2007 Elsevier B.V. All rights reserved.
000059454 536__ $$0G:(DE-Juel1)FUEK412$$2G:(DE-HGF)$$aGrundlagen für zukünftige Informationstechnologien$$cP42$$x0
000059454 588__ $$aDataset connected to Web of Science
000059454 650_7 $$2WoSType$$aJ
000059454 65320 $$2Author$$aaluminum oxide
000059454 65320 $$2Author$$aphase transition
000059454 65320 $$2Author$$asurface relaxation and reconstruction
000059454 7001_ $$0P:(DE-Juel1)VDB14465$$aRose, V.$$b1$$uFZJ
000059454 7001_ $$0P:(DE-Juel1)VDB68514$$aCostina, J.$$b2$$uFZJ
000059454 7001_ $$0P:(DE-Juel1)VDB5400$$aFranchy, R.$$b3$$uFZJ
000059454 773__ $$0PERI:(DE-600)1479030-0$$a10.1016/j.susc.2007.06.003$$gVol. 601, p. 3315 - 3323$$p3315 - 3323$$q601<3315 - 3323$$tSurface science$$v601$$x0039-6028$$y2007
000059454 8567_ $$uhttp://dx.doi.org/10.1016/j.susc.2007.06.003
000059454 909CO $$ooai:juser.fz-juelich.de:59454$$pVDB
000059454 9131_ $$0G:(DE-Juel1)FUEK412$$bSchlüsseltechnologien$$kP42$$lGrundlagen für zukünftige Informationstechnologien (FIT)$$vGrundlagen für zukünftige Informationstechnologien$$x0
000059454 9141_ $$y2007
000059454 915__ $$0StatID:(DE-HGF)0010$$aJCR/ISI refereed
000059454 9201_ $$0I:(DE-Juel1)VDB801$$d31.12.2010$$gIBN$$kIBN-3$$lGrenz- und Oberflächen$$x1
000059454 9201_ $$0I:(DE-Juel1)VDB381$$d14.09.2008$$gCNI$$kCNI$$lCenter of Nanoelectronic Systems for Information Technology$$x2$$z381
000059454 9201_ $$0I:(DE-82)080009_20140620$$gJARA$$kJARA-FIT$$lJülich-Aachen Research Alliance - Fundamentals of Future Information Technology$$x3
000059454 970__ $$aVDB:(DE-Juel1)93521
000059454 980__ $$aVDB
000059454 980__ $$aConvertedRecord
000059454 980__ $$ajournal
000059454 980__ $$aI:(DE-Juel1)PGI-3-20110106
000059454 980__ $$aI:(DE-Juel1)VDB381
000059454 980__ $$aI:(DE-82)080009_20140620
000059454 980__ $$aUNRESTRICTED
000059454 981__ $$aI:(DE-Juel1)PGI-3-20110106
000059454 981__ $$aI:(DE-Juel1)VDB381
000059454 981__ $$aI:(DE-Juel1)VDB881