000006086 001__ 6086
000006086 005__ 20200423202551.0
000006086 0247_ $$2DOI$$a10.1063/1.3167810
000006086 0247_ $$2WOS$$aWOS:000267983200073
000006086 0247_ $$2Handle$$a2128/17298
000006086 037__ $$aPreJuSER-6086
000006086 041__ $$aeng
000006086 082__ $$a530
000006086 084__ $$2WoS$$aPhysics, Applied
000006086 1001_ $$0P:(DE-Juel1)VDB88176$$aYang, Lin.$$b0$$uFZJ
000006086 245__ $$aThe influence of copper top electrode on the resistive switching effect in TiO2 thin films studied by conductive atomic force microscopy
000006086 260__ $$aMelville, NY$$bAmerican Institute of Physics$$c2009
000006086 300__ $$a013109
000006086 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article
000006086 3367_ $$2DataCite$$aOutput Types/Journal article
000006086 3367_ $$00$$2EndNote$$aJournal Article
000006086 3367_ $$2BibTeX$$aARTICLE
000006086 3367_ $$2ORCID$$aJOURNAL_ARTICLE
000006086 3367_ $$2DRIVER$$aarticle
000006086 440_0 $$0562$$aApplied Physics Letters$$v95$$x0003-6951$$y1
000006086 500__ $$aRecord converted from VDB: 12.11.2012
000006086 520__ $$aTitanium dioxide thin films (30 nm) are deposited on platinized substrates by atomic layer deposition and locally studied by conductive atomic force microscopy showing repetitive bipolar resistive switching. Experiments using macroscopic copper top electrodes, which are electroformed, bipolar switched, and removed again from the TiO2-Pt stack, prove the formation of local conductive filaments with bipolar switching properties. The localized filaments can be switched repetitively with a resistance ratio of 30. Our findings underline that Cu diffusion and the formation of filaments are the major mechanism for the resistive switching in Cu/TiO2/Pt cells. (C) 2009 American Institute of Physics. [DOI: 10.1063/1.3167810]
000006086 536__ $$0G:(DE-Juel1)FUEK412$$2G:(DE-HGF)$$aGrundlagen für zukünftige Informationstechnologien$$cP42$$x0
000006086 588__ $$aDataset connected to Web of Science
000006086 650_7 $$2WoSType$$aJ
000006086 7001_ $$0P:(DE-Juel1)VDB15125$$aKügeler, C.$$b1$$uFZJ
000006086 7001_ $$0P:(DE-Juel1)VDB2799$$aSzot, K.$$b2$$uFZJ
000006086 7001_ $$0P:(DE-Juel1)VDB26957$$aRüdiger, A.$$b3$$uFZJ
000006086 7001_ $$0P:(DE-Juel1)131022$$aWaser, R.$$b4$$uFZJ
000006086 773__ $$0PERI:(DE-600)1469436-0$$a10.1063/1.3167810$$gVol. 95, p. 013109$$p013109$$q95<013109$$tApplied physics letters$$v95$$x0003-6951$$y2009
000006086 8567_ $$uhttp://dx.doi.org/10.1063/1.3167810
000006086 8564_ $$uhttps://juser.fz-juelich.de/record/6086/files/1.3167810.pdf$$yOpenAccess
000006086 8564_ $$uhttps://juser.fz-juelich.de/record/6086/files/1.3167810.gif?subformat=icon$$xicon$$yOpenAccess
000006086 8564_ $$uhttps://juser.fz-juelich.de/record/6086/files/1.3167810.jpg?subformat=icon-180$$xicon-180$$yOpenAccess
000006086 8564_ $$uhttps://juser.fz-juelich.de/record/6086/files/1.3167810.jpg?subformat=icon-700$$xicon-700$$yOpenAccess
000006086 8564_ $$uhttps://juser.fz-juelich.de/record/6086/files/1.3167810.pdf?subformat=pdfa$$xpdfa$$yOpenAccess
000006086 909CO $$ooai:juser.fz-juelich.de:6086$$pdnbdelivery$$pdriver$$pVDB$$popen_access$$popenaire
000006086 9131_ $$0G:(DE-Juel1)FUEK412$$bSchlüsseltechnologien$$kP42$$lGrundlagen für zukünftige Informationstechnologien (FIT)$$vGrundlagen für zukünftige Informationstechnologien$$x0
000006086 9141_ $$y2009
000006086 915__ $$0StatID:(DE-HGF)0510$$2StatID$$aOpenAccess
000006086 915__ $$0StatID:(DE-HGF)0010$$aJCR/ISI refereed
000006086 9201_ $$0I:(DE-Juel1)VDB786$$d31.12.2010$$gIFF$$kIFF-6$$lElektronische Materialien$$x0
000006086 9201_ $$0I:(DE-82)080009_20140620$$gJARA$$kJARA-FIT$$lJülich-Aachen Research Alliance - Fundamentals of Future Information Technology$$x1
000006086 970__ $$aVDB:(DE-Juel1)114192
000006086 980__ $$aVDB
000006086 980__ $$aConvertedRecord
000006086 980__ $$ajournal
000006086 980__ $$aI:(DE-Juel1)PGI-7-20110106
000006086 980__ $$aI:(DE-82)080009_20140620
000006086 980__ $$aUNRESTRICTED
000006086 9801_ $$aFullTexts
000006086 981__ $$aI:(DE-Juel1)PGI-7-20110106
000006086 981__ $$aI:(DE-Juel1)VDB881