TY  - JOUR
AU  - Yang, Lin.
AU  - Kügeler, C.
AU  - Szot, K.
AU  - Rüdiger, A.
AU  - Waser, R.
TI  - The influence of copper top electrode on the resistive switching effect in TiO2 thin films studied by conductive atomic force microscopy
JO  - Applied physics letters
VL  - 95
SN  - 0003-6951
CY  - Melville, NY
PB  - American Institute of Physics
M1  - PreJuSER-6086
SP  - 013109
PY  - 2009
N1  - Record converted from VDB: 12.11.2012
AB  - Titanium dioxide thin films (30 nm) are deposited on platinized substrates by atomic layer deposition and locally studied by conductive atomic force microscopy showing repetitive bipolar resistive switching. Experiments using macroscopic copper top electrodes, which are electroformed, bipolar switched, and removed again from the TiO2-Pt stack, prove the formation of local conductive filaments with bipolar switching properties. The localized filaments can be switched repetitively with a resistance ratio of 30. Our findings underline that Cu diffusion and the formation of filaments are the major mechanism for the resistive switching in Cu/TiO2/Pt cells. (C) 2009 American Institute of Physics. [DOI: 10.1063/1.3167810]
KW  - J (WoSType)
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000267983200073
DO  - DOI:10.1063/1.3167810
UR  - https://juser.fz-juelich.de/record/6086
ER  -