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@ARTICLE{Yang:6086,
author = {Yang, Lin. and Kügeler, C. and Szot, K. and Rüdiger, A.
and Waser, R.},
title = {{T}he influence of copper top electrode on the resistive
switching effect in {T}i{O}2 thin films studied by
conductive atomic force microscopy},
journal = {Applied physics letters},
volume = {95},
issn = {0003-6951},
address = {Melville, NY},
publisher = {American Institute of Physics},
reportid = {PreJuSER-6086},
pages = {013109},
year = {2009},
note = {Record converted from VDB: 12.11.2012},
abstract = {Titanium dioxide thin films (30 nm) are deposited on
platinized substrates by atomic layer deposition and locally
studied by conductive atomic force microscopy showing
repetitive bipolar resistive switching. Experiments using
macroscopic copper top electrodes, which are electroformed,
bipolar switched, and removed again from the TiO2-Pt stack,
prove the formation of local conductive filaments with
bipolar switching properties. The localized filaments can be
switched repetitively with a resistance ratio of 30. Our
findings underline that Cu diffusion and the formation of
filaments are the major mechanism for the resistive
switching in Cu/TiO2/Pt cells. (C) 2009 American Institute
of Physics. [DOI: 10.1063/1.3167810]},
keywords = {J (WoSType)},
cin = {IFF-6 / JARA-FIT},
ddc = {530},
cid = {I:(DE-Juel1)VDB786 / $I:(DE-82)080009_20140620$},
pnm = {Grundlagen für zukünftige Informationstechnologien},
pid = {G:(DE-Juel1)FUEK412},
shelfmark = {Physics, Applied},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000267983200073},
doi = {10.1063/1.3167810},
url = {https://juser.fz-juelich.de/record/6086},
}