Home > Publications database > The influence of copper top electrode on the resistive switching effect in TiO2 thin films studied by conductive atomic force microscopy > print

001     6086
005     20200423202551.0
024 7 _ |a 10.1063/1.3167810
|2 DOI
024 7 _ |a WOS:000267983200073
|2 WOS
024 7 _ |a 2128/17298
|2 Handle
037 _ _ |a PreJuSER-6086
041 _ _ |a eng
082 _ _ |a 530
084 _ _ |2 WoS
|a Physics, Applied
100 1 _ |a Yang, Lin.
|b 0
|u FZJ
|0 P:(DE-Juel1)VDB88176
245 _ _ |a The influence of copper top electrode on the resistive switching effect in TiO2 thin films studied by conductive atomic force microscopy
260 _ _ |a Melville, NY
|b American Institute of Physics
|c 2009
300 _ _ |a 013109
336 7 _ |a Journal Article
|0 PUB:(DE-HGF)16
|2 PUB:(DE-HGF)
336 7 _ |a Output Types/Journal article
|2 DataCite
336 7 _ |a Journal Article
|0 0
|2 EndNote
336 7 _ |a ARTICLE
|2 BibTeX
336 7 _ |a JOURNAL_ARTICLE
|2 ORCID
336 7 _ |a article
|2 DRIVER
440 _ 0 |a Applied Physics Letters
|x 0003-6951
|0 562
|y 1
|v 95
500 _ _ |a Record converted from VDB: 12.11.2012
520 _ _ |a Titanium dioxide thin films (30 nm) are deposited on platinized substrates by atomic layer deposition and locally studied by conductive atomic force microscopy showing repetitive bipolar resistive switching. Experiments using macroscopic copper top electrodes, which are electroformed, bipolar switched, and removed again from the TiO2-Pt stack, prove the formation of local conductive filaments with bipolar switching properties. The localized filaments can be switched repetitively with a resistance ratio of 30. Our findings underline that Cu diffusion and the formation of filaments are the major mechanism for the resistive switching in Cu/TiO2/Pt cells. (C) 2009 American Institute of Physics. [DOI: 10.1063/1.3167810]
536 _ _ |a Grundlagen für zukünftige Informationstechnologien
|c P42
|2 G:(DE-HGF)
|0 G:(DE-Juel1)FUEK412
|x 0
588 _ _ |a Dataset connected to Web of Science
650 _ 7 |a J
|2 WoSType
700 1 _ |a Kügeler, C.
|b 1
|u FZJ
|0 P:(DE-Juel1)VDB15125
700 1 _ |a Szot, K.
|b 2
|u FZJ
|0 P:(DE-Juel1)VDB2799
700 1 _ |a Rüdiger, A.
|b 3
|u FZJ
|0 P:(DE-Juel1)VDB26957
700 1 _ |a Waser, R.
|b 4
|u FZJ
|0 P:(DE-Juel1)131022
773 _ _ |a 10.1063/1.3167810
|g Vol. 95, p. 013109
|p 013109
|q 95<013109
|0 PERI:(DE-600)1469436-0
|t Applied physics letters
|v 95
|y 2009
|x 0003-6951
856 7 _ |u http://dx.doi.org/10.1063/1.3167810
856 4 _ |u https://juser.fz-juelich.de/record/6086/files/1.3167810.pdf
|y OpenAccess
856 4 _ |u https://juser.fz-juelich.de/record/6086/files/1.3167810.gif?subformat=icon
|x icon
|y OpenAccess
856 4 _ |u https://juser.fz-juelich.de/record/6086/files/1.3167810.jpg?subformat=icon-180
|x icon-180
|y OpenAccess
856 4 _ |u https://juser.fz-juelich.de/record/6086/files/1.3167810.jpg?subformat=icon-700
|x icon-700
|y OpenAccess
856 4 _ |u https://juser.fz-juelich.de/record/6086/files/1.3167810.pdf?subformat=pdfa
|x pdfa
|y OpenAccess
909 C O |o oai:juser.fz-juelich.de:6086
|p openaire
|p open_access
|p VDB
|p driver
|p dnbdelivery
913 1 _ |k P42
|v Grundlagen für zukünftige Informationstechnologien
|l Grundlagen für zukünftige Informationstechnologien (FIT)
|b Schlüsseltechnologien
|0 G:(DE-Juel1)FUEK412
|x 0
914 1 _ |y 2009
915 _ _ |a OpenAccess
|0 StatID:(DE-HGF)0510
|2 StatID
915 _ _ |a JCR/ISI refereed
|0 StatID:(DE-HGF)0010
920 1 _ |d 31.12.2010
|g IFF
|k IFF-6
|l Elektronische Materialien
|0 I:(DE-Juel1)VDB786
|x 0
920 1 _ |0 I:(DE-82)080009_20140620
|k JARA-FIT
|l Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology
|g JARA
|x 1
970 _ _ |a VDB:(DE-Juel1)114192
980 _ _ |a VDB
980 _ _ |a ConvertedRecord
980 _ _ |a journal
980 _ _ |a I:(DE-Juel1)PGI-7-20110106
980 _ _ |a I:(DE-82)080009_20140620
980 _ _ |a UNRESTRICTED
980 1 _ |a FullTexts
981 _ _ |a I:(DE-Juel1)PGI-7-20110106
981 _ _ |a I:(DE-Juel1)VDB881

LibraryCollectionCLSMajorCLSMinorLanguageAuthor
Marc 21