TY  - JOUR
AU  - Durgun Özben, E.
AU  - Lopes, J. M. J.
AU  - Roeckerath, M.
AU  - Lenk, S.
AU  - Holländer, B.
AU  - Jia, Y.
AU  - Schlom, D. G.
AU  - Schubert, J.
AU  - Mantl, S.
TI  - SmScO3 thin films as an alternative gate dielectric
JO  - Applied physics letters
VL  - 93
SN  - 0003-6951
CY  - Melville, NY
PB  - American Institute of Physics
M1  - PreJuSER-62958
SP  - 052902-1 - 052902-3
PY  - 2008
N1  - Record converted from VDB: 12.11.2012
AB  - Samarium scandate thin films deposited on (100) Si have been investigated structurally and electrically. Rutherford backscattering spectrometry and transmission electron microscopy results show that the films are stoichiometric, amorphous, and smooth. X-ray diffraction analysis indicates that SmScO3 starts to crystallize at 900 degrees C. Capacitance and leakage current measurements reveal C-V curves with negligible hysteresis, a dielectric constant around 29 for 6 nm thick films, low leakage current densities in the range of 10(-7) A/cm(2), an effective oxide charge density of similar to 5x10(11) cm(-2), and an interface trap density of 4.5x10(11) (eV cm(2))(-1). (C) 2008 American Institute of Physics.
KW  - J (WoSType)
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000258335900049
DO  - DOI:10.1063/1.2968660
UR  - https://juser.fz-juelich.de/record/62958
ER  -