Hauptseite > Publikationsdatenbank > Morphological and electical changes in TiO2 memristive devices induced by elecroforming and switching > print |
001 | 6319 | ||
005 | 20180208220417.0 | ||
024 | 7 | _ | |2 DOI |a 10.1002/pssr.200903347 |
024 | 7 | _ | |2 WOS |a WOS:000275226400015 |
037 | _ | _ | |a PreJuSER-6319 |
041 | _ | _ | |a eng |
082 | _ | _ | |a 530 |
084 | _ | _ | |2 WoS |a Materials Science, Multidisciplinary |
084 | _ | _ | |2 WoS |a Physics, Applied |
084 | _ | _ | |2 WoS |a Physics, Condensed Matter |
100 | 1 | _ | |a Münstermann, R. |b 0 |u FZJ |0 P:(DE-Juel1)VDB64025 |
245 | _ | _ | |a Morphological and electical changes in TiO2 memristive devices induced by elecroforming and switching |
260 | _ | _ | |a Weinheim |b Wiley-VCH |c 2010 |
300 | _ | _ | |a |
336 | 7 | _ | |a Journal Article |0 PUB:(DE-HGF)16 |2 PUB:(DE-HGF) |
336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
336 | 7 | _ | |a ARTICLE |2 BibTeX |
336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
336 | 7 | _ | |a article |2 DRIVER |
440 | _ | 0 | |a Physica Status Solidi - Rapid Research Letters |x 1862-6254 |0 16681 |y 1 |v 4 |
500 | _ | _ | |a This research was funded in part by the US Government's Nano-Enabled Technology Initiative. |
520 | _ | _ | |a Combining delamination technique with conductive AFM, we have been able to reveal spatially resolved morphology and conductance changes in TiO2 memristive junctions after electroforming and switching. Being able to distingusish between effects caused by electroforming and switching, respectively, we could demonstrate that electroforming results in the creation of localized conductance channels induced by oxgen evolution while subsequent resistive switching causes an additional conducting structure next to the forming spot. We observe that the lateral extent of this structure depends on the number of switching cycles indicating an ongoing breaking of existing and creation of neighbouring current channels during subsequent switching. |
536 | _ | _ | |a Grundlagen für zukünftige Informationstechnologien |c P42 |2 G:(DE-HGF) |0 G:(DE-Juel1)FUEK412 |x 0 |
588 | _ | _ | |a Dataset connected to Web of Science |
650 | _ | 7 | |a J |2 WoSType |
700 | 1 | _ | |a Yang, J.J. |b 1 |0 P:(DE-HGF)0 |
700 | 1 | _ | |a Strachan, J.P. |b 2 |0 P:(DE-HGF)0 |
700 | 1 | _ | |a Medeiros-Ribeiro, G. |b 3 |0 P:(DE-HGF)0 |
700 | 1 | _ | |a Dittmann, R. |b 4 |u FZJ |0 P:(DE-Juel1)VDB5464 |
700 | 1 | _ | |a Waser, R. |b 5 |u FZJ |0 P:(DE-Juel1)131022 |
773 | _ | _ | |a 10.1002/pssr.200903347 |g Vol. 4 |q 4 |0 PERI:(DE-600)2259465-6 |t Physica status solidi / Rapid research letters |v 4 |y 2010 |x 1862-6254 |
856 | 7 | _ | |u http://dx.doi.org/10.1002/pssr.200903347 |
909 | C | O | |o oai:juser.fz-juelich.de:6319 |p VDB |
913 | 1 | _ | |k P42 |v Grundlagen für zukünftige Informationstechnologien |l Grundlagen für zukünftige Informationstechnologien (FIT) |b Schlüsseltechnologien |0 G:(DE-Juel1)FUEK412 |x 0 |
914 | 1 | _ | |y 2010 |
915 | _ | _ | |0 StatID:(DE-HGF)0010 |a JCR/ISI refereed |
915 | _ | _ | |0 StatID:(DE-HGF)0020 |a No peer review |
920 | 1 | _ | |d 31.12.2010 |g IFF |k IFF-6 |l Elektronische Materialien |0 I:(DE-Juel1)VDB786 |x 0 |
920 | 1 | _ | |0 I:(DE-82)080009_20140620 |k JARA-FIT |l Jülich-Aachen Research Alliance - Fundamentals of Future Information Technology |g JARA |x 1 |
970 | _ | _ | |a VDB:(DE-Juel1)114526 |
980 | _ | _ | |a VDB |
980 | _ | _ | |a ConvertedRecord |
980 | _ | _ | |a journal |
980 | _ | _ | |a I:(DE-Juel1)PGI-7-20110106 |
980 | _ | _ | |a I:(DE-82)080009_20140620 |
980 | _ | _ | |a UNRESTRICTED |
981 | _ | _ | |a I:(DE-Juel1)PGI-7-20110106 |
981 | _ | _ | |a I:(DE-Juel1)VDB881 |
Library | Collection | CLSMajor | CLSMinor | Language | Author |
---|