%0 Journal Article
%A Kim, Hyun-su
%A Li, Wei
%A Marconi, Mario C.
%A Brocklesby, William S.
%A Juschkin, Larissa
%T Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
%J IEEE photonics journal
%V 8
%N 3
%@ 1943-0655
%C New York, NY
%I IEEE
%M FZJ-2016-02787
%P 1 - 9
%D 2016
%X Self-imaging is a well-known optical phenomenon produced by diffraction of a coherent beam in a periodic structure. The self-imaging effect (or Talbot effect) replicates the field intensity at a periodic mask in certain planes, effectively producing in those planes an image of the mask. However, the effect has not been analyzed for a rough-line grid from the point of view of the fidelity of the image. In this paper, we investigate the restorative effect of the self-image applied to the lithography of gratings with rough lines. This paper is applied to characterize a Talbot lithography experiment implemented in the extreme ultraviolet. With the self-imaging technique, a mask with grid patterns having bumps randomly placed along the line edges reproduces a grid pattern with smoothed line edges. Simulation explores the approach further for the cases of sub-100-nm pitch grids.Impact Statement We investigate the restorative effect of the self-image applied to the lithography of gratings with rough lines. This paper is applied to characterize a Talbot lithography experiment implemented in the extreme ultraviolet. With the self-imaging technique, a mask with grid patterns having bumps randomly placed along the line edges reproduces a grid pattern with smoothed line edges. Simulation explores the approach further for the cases of sub-100-nm pitch grids.
%F PUB:(DE-HGF)16
%9 Journal Article
%U <Go to ISI:>//WOS:000376282700011
%R 10.1109/JPHOT.2016.2553847
%U https://juser.fz-juelich.de/record/809861