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000809861 1001_ $$0P:(DE-HGF)0$$aKim, Hyun-su$$b0$$eCorresponding author
000809861 245__ $$aRestorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
000809861 260__ $$aNew York, NY$$bIEEE$$c2016
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000809861 520__ $$aSelf-imaging is a well-known optical phenomenon produced by diffraction of a coherent beam in a periodic structure. The self-imaging effect (or Talbot effect) replicates the field intensity at a periodic mask in certain planes, effectively producing in those planes an image of the mask. However, the effect has not been analyzed for a rough-line grid from the point of view of the fidelity of the image. In this paper, we investigate the restorative effect of the self-image applied to the lithography of gratings with rough lines. This paper is applied to characterize a Talbot lithography experiment implemented in the extreme ultraviolet. With the self-imaging technique, a mask with grid patterns having bumps randomly placed along the line edges reproduces a grid pattern with smoothed line edges. Simulation explores the approach further for the cases of sub-100-nm pitch grids.Impact Statement We investigate the restorative effect of the self-image applied to the lithography of gratings with rough lines. This paper is applied to characterize a Talbot lithography experiment implemented in the extreme ultraviolet. With the self-imaging technique, a mask with grid patterns having bumps randomly placed along the line edges reproduces a grid pattern with smoothed line edges. Simulation explores the approach further for the cases of sub-100-nm pitch grids.
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000809861 7001_ $$0P:(DE-HGF)0$$aLi, Wei$$b1
000809861 7001_ $$0P:(DE-HGF)0$$aMarconi, Mario C.$$b2
000809861 7001_ $$0P:(DE-HGF)0$$aBrocklesby, William S.$$b3
000809861 7001_ $$0P:(DE-Juel1)157957$$aJuschkin, Larissa$$b4
000809861 773__ $$0PERI:(DE-600)2495610-7$$a10.1109/JPHOT.2016.2553847$$gVol. 8, no. 3, p. 1 - 9$$n3$$p1 - 9$$tIEEE photonics journal$$v8$$x1943-0655$$y2016
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