TY  - JOUR
AU  - Kim, Hyun-su
AU  - Li, Wei
AU  - Marconi, Mario C.
AU  - Brocklesby, William S.
AU  - Juschkin, Larissa
TI  - Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography
JO  - IEEE photonics journal
VL  - 8
IS  - 3
SN  - 1943-0655
CY  - New York, NY
PB  - IEEE
M1  - FZJ-2016-02787
SP  - 1 - 9
PY  - 2016
AB  - Self-imaging is a well-known optical phenomenon produced by diffraction of a coherent beam in a periodic structure. The self-imaging effect (or Talbot effect) replicates the field intensity at a periodic mask in certain planes, effectively producing in those planes an image of the mask. However, the effect has not been analyzed for a rough-line grid from the point of view of the fidelity of the image. In this paper, we investigate the restorative effect of the self-image applied to the lithography of gratings with rough lines. This paper is applied to characterize a Talbot lithography experiment implemented in the extreme ultraviolet. With the self-imaging technique, a mask with grid patterns having bumps randomly placed along the line edges reproduces a grid pattern with smoothed line edges. Simulation explores the approach further for the cases of sub-100-nm pitch grids.Impact Statement We investigate the restorative effect of the self-image applied to the lithography of gratings with rough lines. This paper is applied to characterize a Talbot lithography experiment implemented in the extreme ultraviolet. With the self-imaging technique, a mask with grid patterns having bumps randomly placed along the line edges reproduces a grid pattern with smoothed line edges. Simulation explores the approach further for the cases of sub-100-nm pitch grids.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000376282700011
DO  - DOI:10.1109/JPHOT.2016.2553847
UR  - https://juser.fz-juelich.de/record/809861
ER  -