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@ARTICLE{Kim:809861,
      author       = {Kim, Hyun-su and Li, Wei and Marconi, Mario C. and
                      Brocklesby, William S. and Juschkin, Larissa},
      title        = {{R}estorative {S}elf-{I}mage of {R}ough-{L}ine {G}rids:
                      {A}pplication to {C}oherent {EUV} {T}albot {L}ithography},
      journal      = {IEEE photonics journal},
      volume       = {8},
      number       = {3},
      issn         = {1943-0655},
      address      = {New York, NY},
      publisher    = {IEEE},
      reportid     = {FZJ-2016-02787},
      pages        = {1 - 9},
      year         = {2016},
      abstract     = {Self-imaging is a well-known optical phenomenon produced by
                      diffraction of a coherent beam in a periodic structure. The
                      self-imaging effect (or Talbot effect) replicates the field
                      intensity at a periodic mask in certain planes, effectively
                      producing in those planes an image of the mask. However, the
                      effect has not been analyzed for a rough-line grid from the
                      point of view of the fidelity of the image. In this paper,
                      we investigate the restorative effect of the self-image
                      applied to the lithography of gratings with rough lines.
                      This paper is applied to characterize a Talbot lithography
                      experiment implemented in the extreme ultraviolet. With the
                      self-imaging technique, a mask with grid patterns having
                      bumps randomly placed along the line edges reproduces a grid
                      pattern with smoothed line edges. Simulation explores the
                      approach further for the cases of sub-100-nm pitch
                      grids.Impact Statement We investigate the restorative effect
                      of the self-image applied to the lithography of gratings
                      with rough lines. This paper is applied to characterize a
                      Talbot lithography experiment implemented in the extreme
                      ultraviolet. With the self-imaging technique, a mask with
                      grid patterns having bumps randomly placed along the line
                      edges reproduces a grid pattern with smoothed line edges.
                      Simulation explores the approach further for the cases of
                      sub-100-nm pitch grids.},
      cin          = {PGI-9 / JARA-FIT},
      ddc          = {620},
      cid          = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$},
      pnm          = {521 - Controlling Electron Charge-Based Phenomena
                      (POF3-521)},
      pid          = {G:(DE-HGF)POF3-521},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000376282700011},
      doi          = {10.1109/JPHOT.2016.2553847},
      url          = {https://juser.fz-juelich.de/record/809861},
}