guest ::
| Home > Publications database > Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography > print |
| Home > Publications database > Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography > print |
| 001 | 809861 | ||
| 005 | 20220930130100.0 | ||
| 024 | 7 | _ | |a 10.1109/JPHOT.2016.2553847 |2 doi |
| 024 | 7 | _ | |a 2128/11738 |2 Handle |
| 024 | 7 | _ | |a WOS:000376282700011 |2 WOS |
| 037 | _ | _ | |a FZJ-2016-02787 |
| 082 | _ | _ | |a 620 |
| 100 | 1 | _ | |a Kim, Hyun-su |0 P:(DE-HGF)0 |b 0 |e Corresponding author |
| 245 | _ | _ | |a Restorative Self-Image of Rough-Line Grids: Application to Coherent EUV Talbot Lithography |
| 260 | _ | _ | |a New York, NY |c 2016 |b IEEE |
| 336 | 7 | _ | |a article |2 DRIVER |
| 336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
| 336 | 7 | _ | |a Journal Article |b journal |m journal |0 PUB:(DE-HGF)16 |s 1467706049_2699 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a ARTICLE |2 BibTeX |
| 336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
| 336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
| 520 | _ | _ | |a Self-imaging is a well-known optical phenomenon produced by diffraction of a coherent beam in a periodic structure. The self-imaging effect (or Talbot effect) replicates the field intensity at a periodic mask in certain planes, effectively producing in those planes an image of the mask. However, the effect has not been analyzed for a rough-line grid from the point of view of the fidelity of the image. In this paper, we investigate the restorative effect of the self-image applied to the lithography of gratings with rough lines. This paper is applied to characterize a Talbot lithography experiment implemented in the extreme ultraviolet. With the self-imaging technique, a mask with grid patterns having bumps randomly placed along the line edges reproduces a grid pattern with smoothed line edges. Simulation explores the approach further for the cases of sub-100-nm pitch grids.Impact Statement We investigate the restorative effect of the self-image applied to the lithography of gratings with rough lines. This paper is applied to characterize a Talbot lithography experiment implemented in the extreme ultraviolet. With the self-imaging technique, a mask with grid patterns having bumps randomly placed along the line edges reproduces a grid pattern with smoothed line edges. Simulation explores the approach further for the cases of sub-100-nm pitch grids. |
| 536 | _ | _ | |a 521 - Controlling Electron Charge-Based Phenomena (POF3-521) |0 G:(DE-HGF)POF3-521 |c POF3-521 |f POF III |x 0 |
| 588 | _ | _ | |a Dataset connected to CrossRef |
| 700 | 1 | _ | |a Li, Wei |0 P:(DE-HGF)0 |b 1 |
| 700 | 1 | _ | |a Marconi, Mario C. |0 P:(DE-HGF)0 |b 2 |
| 700 | 1 | _ | |a Brocklesby, William S. |0 P:(DE-HGF)0 |b 3 |
| 700 | 1 | _ | |a Juschkin, Larissa |0 P:(DE-Juel1)157957 |b 4 |
| 773 | _ | _ | |a 10.1109/JPHOT.2016.2553847 |g Vol. 8, no. 3, p. 1 - 9 |0 PERI:(DE-600)2495610-7 |n 3 |p 1 - 9 |t IEEE photonics journal |v 8 |y 2016 |x 1943-0655 |
| 856 | 4 | _ | |y OpenAccess |u https://juser.fz-juelich.de/record/809861/files/07452341.pdf |
| 856 | 4 | _ | |y OpenAccess |x icon |u https://juser.fz-juelich.de/record/809861/files/07452341.gif?subformat=icon |
| 856 | 4 | _ | |y OpenAccess |x icon-1440 |u https://juser.fz-juelich.de/record/809861/files/07452341.jpg?subformat=icon-1440 |
| 856 | 4 | _ | |y OpenAccess |x icon-180 |u https://juser.fz-juelich.de/record/809861/files/07452341.jpg?subformat=icon-180 |
| 856 | 4 | _ | |y OpenAccess |x icon-640 |u https://juser.fz-juelich.de/record/809861/files/07452341.jpg?subformat=icon-640 |
| 856 | 4 | _ | |y OpenAccess |x pdfa |u https://juser.fz-juelich.de/record/809861/files/07452341.pdf?subformat=pdfa |
| 909 | C | O | |o oai:juser.fz-juelich.de:809861 |p openaire |p open_access |p OpenAPC |p driver |p VDB |p openCost |p dnbdelivery |
| 910 | 1 | _ | |a Forschungszentrum Jülich |0 I:(DE-588b)5008462-8 |k FZJ |b 0 |6 P:(DE-Juel1)166021 |
| 910 | 1 | _ | |a Forschungszentrum Jülich |0 I:(DE-588b)5008462-8 |k FZJ |b 4 |6 P:(DE-Juel1)157957 |
| 910 | 1 | _ | |a RWTH Aachen |0 I:(DE-588b)36225-6 |k RWTH |b 4 |6 P:(DE-Juel1)157957 |
| 913 | 1 | _ | |a DE-HGF |b Key Technologies |l Future Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT) |1 G:(DE-HGF)POF3-520 |0 G:(DE-HGF)POF3-521 |2 G:(DE-HGF)POF3-500 |v Controlling Electron Charge-Based Phenomena |x 0 |4 G:(DE-HGF)POF |3 G:(DE-HGF)POF3 |
| 914 | 1 | _ | |y 2016 |
| 915 | _ | _ | |a DBCoverage |0 StatID:(DE-HGF)0200 |2 StatID |b SCOPUS |
| 915 | _ | _ | |a DBCoverage |0 StatID:(DE-HGF)1160 |2 StatID |b Current Contents - Engineering, Computing and Technology |
| 915 | _ | _ | |a JCR |0 StatID:(DE-HGF)0100 |2 StatID |b IEEE PHOTONICS J : 2014 |
| 915 | _ | _ | |a DBCoverage |0 StatID:(DE-HGF)0500 |2 StatID |b DOAJ |
| 915 | _ | _ | |a WoS |0 StatID:(DE-HGF)0111 |2 StatID |b Science Citation Index Expanded |
| 915 | _ | _ | |a DBCoverage |0 StatID:(DE-HGF)0150 |2 StatID |b Web of Science Core Collection |
| 915 | _ | _ | |a IF < 5 |0 StatID:(DE-HGF)9900 |2 StatID |
| 915 | _ | _ | |a OpenAccess |0 StatID:(DE-HGF)0510 |2 StatID |
| 915 | _ | _ | |a DBCoverage |0 StatID:(DE-HGF)1150 |2 StatID |b Current Contents - Physical, Chemical and Earth Sciences |
| 915 | _ | _ | |a DBCoverage |0 StatID:(DE-HGF)0300 |2 StatID |b Medline |
| 915 | _ | _ | |a DBCoverage |0 StatID:(DE-HGF)0199 |2 StatID |b Thomson Reuters Master Journal List |
| 920 | _ | _ | |l yes |
| 920 | 1 | _ | |0 I:(DE-Juel1)PGI-9-20110106 |k PGI-9 |l Halbleiter-Nanoelektronik |x 0 |
| 920 | 1 | _ | |0 I:(DE-82)080009_20140620 |k JARA-FIT |l JARA-FIT |x 1 |
| 980 | 1 | _ | |a FullTexts |
| 980 | _ | _ | |a journal |
| 980 | _ | _ | |a VDB |
| 980 | _ | _ | |a UNRESTRICTED |
| 980 | _ | _ | |a I:(DE-Juel1)PGI-9-20110106 |
| 980 | _ | _ | |a I:(DE-82)080009_20140620 |
| 980 | _ | _ | |a APC |
| Library | Collection | CLSMajor | CLSMinor | Language | Author |
|---|