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@ARTICLE{Kim:809864,
      author       = {Kim, Hyun-su and Li, W. and Danylyuk, S. and Brocklesby, W.
                      S. and Marconi, M. C. and Juschkin, Larissa},
      title        = {{O}ptical properties of 2{D} fractional {T}albot patterns
                      under coherent {EUV} illumination},
      journal      = {Journal of physics / D},
      volume       = {48},
      number       = {37},
      issn         = {1361-6463},
      address      = {Bristol},
      publisher    = {IOP Publ.},
      reportid     = {FZJ-2016-02790},
      pages        = {375101 -},
      year         = {2015},
      abstract     = {We investigate optical properties of (2D) fractional Talbot
                      patterns under illumination with EUV laser light. The
                      fractional Talbot effect, due to spatial frequency
                      multiplication, can enable patterning of micro and
                      nano-structures with various feature sizes using a
                      micro-scale pitch mask. The experiment is performed with a
                      free-standing mask fabricated by focused ion beam milling
                      and a highly coherent illumination at 46.9 nm wavelength
                      generated by a compact capillary discharge Ne-like Argon
                      laser. As a result of spatial frequency multiplication,
                      structure density of a square array of apertures in the mask
                      was increased by a factor of up to 9 at the recording plane.
                      The depth of field of the fractional Talbot images has been
                      investigated using Fresnel diffraction analysis. Added field
                      distribution complexity caused by asymmetry of the 2D arrays
                      was observed both in simulation and in the experiment. This
                      approach could be useful for sub-micron structuring of 2D
                      patterns for various applications including among others the
                      fabrication of photonic crystals, quantum dots, and also of
                      submicron-electronic devices.},
      cin          = {PGI-9 / JARA-FIT},
      ddc          = {530},
      cid          = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$},
      pnm          = {521 - Controlling Electron Charge-Based Phenomena
                      (POF3-521)},
      pid          = {G:(DE-HGF)POF3-521},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000360975100003},
      doi          = {10.1088/0022-3727/48/37/375101},
      url          = {https://juser.fz-juelich.de/record/809864},
}