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000809865 1001_ $$0P:(DE-HGF)0$$aKim, Hyun-su$$b0$$eCorresponding author
000809865 245__ $$aFractional Talbot lithography with extreme ultraviolet light
000809865 260__ $$aWashington, DC$$bSoc.$$c2014
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000809865 520__ $$aFractional Talbot effect leads to the possibility to implement patterning of structures with smaller periods than the master mask. This is particularly attractive when using short wavelength illumination in the extreme ultraviolet because of attainable resolution in the sub-100-nm range. In this Letter, we demonstrate the Talbot lithography with the fractional Talbot effect under coherent illumination generated with a capillary discharge Ne-like Ar extreme ultraviolet laser. Various spatial frequency multiplications up to 5
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000809865 7001_ $$0P:(DE-HGF)0$$aDanylyuk, Serhiy$$b2
000809865 7001_ $$0P:(DE-HGF)0$$aBrocklesby, William S.$$b3
000809865 7001_ $$0P:(DE-HGF)0$$aMarconi, Mario C.$$b4
000809865 7001_ $$0P:(DE-Juel1)157957$$aJuschkin, Larissa$$b5$$eCorresponding author
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