TY  - JOUR
AU  - Kim, Hyun-su
AU  - Li, Wei
AU  - Danylyuk, Serhiy
AU  - Brocklesby, William S.
AU  - Marconi, Mario C.
AU  - Juschkin, Larissa
TI  - Fractional Talbot lithography with extreme ultraviolet light
JO  - Optics letters
VL  - 39
IS  - 24
SN  - 1539-4794
CY  - Washington, DC
PB  - Soc.
M1  - FZJ-2016-02791
SP  - 6969-6972
PY  - 2014
AB  - Fractional Talbot effect leads to the possibility to implement patterning of structures with smaller periods than the master mask. This is particularly attractive when using short wavelength illumination in the extreme ultraviolet because of attainable resolution in the sub-100-nm range. In this Letter, we demonstrate the Talbot lithography with the fractional Talbot effect under coherent illumination generated with a capillary discharge Ne-like Ar extreme ultraviolet laser. Various spatial frequency multiplications up to 5𝑥 are achieved using a parent grating. This technique allows a fabrication of nanostructures with high-resolution patterns, which is of high interest in many applications such as the manufacturing of plasmonic surfaces and photonic devices.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000346347900052
C6  - pmid:25503043
DO  - DOI:10.1364/OL.39.006969
UR  - https://juser.fz-juelich.de/record/809865
ER  -