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@ARTICLE{Kim:809865,
author = {Kim, Hyun-su and Li, Wei and Danylyuk, Serhiy and
Brocklesby, William S. and Marconi, Mario C. and Juschkin,
Larissa},
title = {{F}ractional {T}albot lithography with extreme ultraviolet
light},
journal = {Optics letters},
volume = {39},
number = {24},
issn = {1539-4794},
address = {Washington, DC},
publisher = {Soc.},
reportid = {FZJ-2016-02791},
pages = {6969-6972},
year = {2014},
abstract = {Fractional Talbot effect leads to the possibility to
implement patterning of structures with smaller periods than
the master mask. This is particularly attractive when using
short wavelength illumination in the extreme ultraviolet
because of attainable resolution in the sub-100-nm range. In
this Letter, we demonstrate the Talbot lithography with the
fractional Talbot effect under coherent illumination
generated with a capillary discharge Ne-like Ar extreme
ultraviolet laser. Various spatial frequency multiplications
up to 5𝑥 are achieved using a parent grating. This
technique allows a fabrication of nanostructures with
high-resolution patterns, which is of high interest in many
applications such as the manufacturing of plasmonic surfaces
and photonic devices.},
cin = {PGI-9 / JARA-FIT},
ddc = {530},
cid = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$},
pnm = {521 - Controlling Electron Charge-Based Phenomena
(POF3-521)},
pid = {G:(DE-HGF)POF3-521},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000346347900052},
pubmed = {pmid:25503043},
doi = {10.1364/OL.39.006969},
url = {https://juser.fz-juelich.de/record/809865},
}