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| Hauptseite > Publikationsdatenbank > Fractional Talbot lithography with extreme ultraviolet light > print |
| Hauptseite > Publikationsdatenbank > Fractional Talbot lithography with extreme ultraviolet light > print |
| 001 | 809865 | ||
| 005 | 20210129223155.0 | ||
| 024 | 7 | _ | |a 10.1364/OL.39.006969 |2 doi |
| 024 | 7 | _ | |a 0146-9592 |2 ISSN |
| 024 | 7 | _ | |a 1539-4794 |2 ISSN |
| 024 | 7 | _ | |a WOS:000346347900052 |2 WOS |
| 024 | 7 | _ | |a altmetric:2980912 |2 altmetric |
| 024 | 7 | _ | |a pmid:25503043 |2 pmid |
| 037 | _ | _ | |a FZJ-2016-02791 |
| 082 | _ | _ | |a 530 |
| 100 | 1 | _ | |a Kim, Hyun-su |0 P:(DE-HGF)0 |b 0 |e Corresponding author |
| 245 | _ | _ | |a Fractional Talbot lithography with extreme ultraviolet light |
| 260 | _ | _ | |a Washington, DC |c 2014 |b Soc. |
| 336 | 7 | _ | |a article |2 DRIVER |
| 336 | 7 | _ | |a Output Types/Journal article |2 DataCite |
| 336 | 7 | _ | |a Journal Article |b journal |m journal |0 PUB:(DE-HGF)16 |s 1467706595_2695 |2 PUB:(DE-HGF) |
| 336 | 7 | _ | |a ARTICLE |2 BibTeX |
| 336 | 7 | _ | |a JOURNAL_ARTICLE |2 ORCID |
| 336 | 7 | _ | |a Journal Article |0 0 |2 EndNote |
| 520 | _ | _ | |a Fractional Talbot effect leads to the possibility to implement patterning of structures with smaller periods than the master mask. This is particularly attractive when using short wavelength illumination in the extreme ultraviolet because of attainable resolution in the sub-100-nm range. In this Letter, we demonstrate the Talbot lithography with the fractional Talbot effect under coherent illumination generated with a capillary discharge Ne-like Ar extreme ultraviolet laser. Various spatial frequency multiplications up to 5𝑥 are achieved using a parent grating. This technique allows a fabrication of nanostructures with high-resolution patterns, which is of high interest in many applications such as the manufacturing of plasmonic surfaces and photonic devices. |
| 536 | _ | _ | |a 521 - Controlling Electron Charge-Based Phenomena (POF3-521) |0 G:(DE-HGF)POF3-521 |c POF3-521 |f POF III |x 0 |
| 588 | _ | _ | |a Dataset connected to CrossRef |
| 700 | 1 | _ | |a Li, Wei |0 P:(DE-HGF)0 |b 1 |
| 700 | 1 | _ | |a Danylyuk, Serhiy |0 P:(DE-HGF)0 |b 2 |
| 700 | 1 | _ | |a Brocklesby, William S. |0 P:(DE-HGF)0 |b 3 |
| 700 | 1 | _ | |a Marconi, Mario C. |0 P:(DE-HGF)0 |b 4 |
| 700 | 1 | _ | |a Juschkin, Larissa |0 P:(DE-Juel1)157957 |b 5 |e Corresponding author |
| 773 | _ | _ | |a 10.1364/OL.39.006969 |g Vol. 39, no. 24, p. 6969 - |0 PERI:(DE-600)1479014-2 |n 24 |p 6969-6972 |t Optics letters |v 39 |y 2014 |x 1539-4794 |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/809865/files/ol-39-24-6969.pdf |y Restricted |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/809865/files/ol-39-24-6969.gif?subformat=icon |x icon |y Restricted |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/809865/files/ol-39-24-6969.jpg?subformat=icon-1440 |x icon-1440 |y Restricted |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/809865/files/ol-39-24-6969.jpg?subformat=icon-180 |x icon-180 |y Restricted |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/809865/files/ol-39-24-6969.jpg?subformat=icon-640 |x icon-640 |y Restricted |
| 856 | 4 | _ | |u https://juser.fz-juelich.de/record/809865/files/ol-39-24-6969.pdf?subformat=pdfa |x pdfa |y Restricted |
| 909 | C | O | |o oai:juser.fz-juelich.de:809865 |p VDB |
| 910 | 1 | _ | |a Forschungszentrum Jülich |0 I:(DE-588b)5008462-8 |k FZJ |b 0 |6 P:(DE-Juel1)166021 |
| 910 | 1 | _ | |a RWTH Aachen |0 I:(DE-588b)36225-6 |k RWTH |b 2 |6 P:(DE-HGF)0 |
| 910 | 1 | _ | |a Forschungszentrum Jülich |0 I:(DE-588b)5008462-8 |k FZJ |b 5 |6 P:(DE-Juel1)157957 |
| 910 | 1 | _ | |a RWTH Aachen |0 I:(DE-588b)36225-6 |k RWTH |b 5 |6 P:(DE-Juel1)157957 |
| 913 | 1 | _ | |a DE-HGF |b Key Technologies |l Future Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT) |1 G:(DE-HGF)POF3-520 |0 G:(DE-HGF)POF3-521 |2 G:(DE-HGF)POF3-500 |v Controlling Electron Charge-Based Phenomena |x 0 |4 G:(DE-HGF)POF |3 G:(DE-HGF)POF3 |
| 914 | 1 | _ | |y 2016 |
| 915 | _ | _ | |a DBCoverage |0 StatID:(DE-HGF)0200 |2 StatID |b SCOPUS |
| 915 | _ | _ | |a DBCoverage |0 StatID:(DE-HGF)0300 |2 StatID |b Medline |
| 915 | _ | _ | |a JCR |0 StatID:(DE-HGF)0100 |2 StatID |b OPT LETT : 2014 |
| 915 | _ | _ | |a DBCoverage |0 StatID:(DE-HGF)0199 |2 StatID |b Thomson Reuters Master Journal List |
| 915 | _ | _ | |a WoS |0 StatID:(DE-HGF)0110 |2 StatID |b Science Citation Index |
| 915 | _ | _ | |a DBCoverage |0 StatID:(DE-HGF)0150 |2 StatID |b Web of Science Core Collection |
| 915 | _ | _ | |a WoS |0 StatID:(DE-HGF)0111 |2 StatID |b Science Citation Index Expanded |
| 915 | _ | _ | |a DBCoverage |0 StatID:(DE-HGF)1150 |2 StatID |b Current Contents - Physical, Chemical and Earth Sciences |
| 915 | _ | _ | |a DBCoverage |0 StatID:(DE-HGF)1160 |2 StatID |b Current Contents - Engineering, Computing and Technology |
| 915 | _ | _ | |a IF < 5 |0 StatID:(DE-HGF)9900 |2 StatID |
| 920 | _ | _ | |l yes |
| 920 | 1 | _ | |0 I:(DE-Juel1)PGI-9-20110106 |k PGI-9 |l Halbleiter-Nanoelektronik |x 0 |
| 920 | 1 | _ | |0 I:(DE-82)080009_20140620 |k JARA-FIT |l JARA-FIT |x 1 |
| 980 | _ | _ | |a journal |
| 980 | _ | _ | |a VDB |
| 980 | _ | _ | |a I:(DE-Juel1)PGI-9-20110106 |
| 980 | _ | _ | |a I:(DE-82)080009_20140620 |
| 980 | _ | _ | |a UNRESTRICTED |
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