TY  - JOUR
AU  - Kampmeier, Jörn
AU  - Weyrich, Christian
AU  - Lanius, Martin
AU  - Schall, Melissa
AU  - Neumann, Elmar
AU  - Mussler, Gregor
AU  - Schäpers, Thomas
AU  - Grützmacher, Detlev
TI  - Selective area growth of Bi$_{2}$Te$_{3}$ and Sb$_{2}$Te$_{3}$ topological insulator thin films
JO  - Journal of crystal growth
VL  - 443
SN  - 0022-0248
CY  - Amsterdam [u.a.]
PB  - Elsevier
M1  - FZJ-2016-04083
SP  - 38 - 42
PY  - 2016
AB  - The intrinsic bulk behavior of topological insulators (TI) is a key issue for their employment in future device applications. State of the art TIs predominantly suffer from large bulk charge carrier concentrations that mask their extraordinary surface states. In this paper we present the selective area growth of Bi2Te3 and Sb2Te3 TI thin films on prestructured Si(111) Si on insulator (SOI) substrates, paving the way to high quality TI nanostructures in which access to surface states is enhanced. Therefore high quality Bi2Te3 and Sb2Te3 thin films were deposited by means of solid source molecular beam epitaxy (MBE) and subsequently investigated by energy dispersive x-ray spectroscopy (EDX). To investigate the transport properties of the selectively grown thin films, magnetotransport measurements were performed at low temperatures. Nucleation in the SiO2 valleys next to the prepatterned Si(111) mesa structures was not observed. The structural and morphological qualities of crystals deposited on untreated Si(111) SOI wafers are completely preserved by employing the selective area growth on prepatterned substrates. The transport characteristics of the selectively-grown TI systems are comparable to those of the analogous postpatterned films.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000375507500007
DO  - DOI:10.1016/j.jcrysgro.2016.03.012
UR  - https://juser.fz-juelich.de/record/811699
ER  -