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@ARTICLE{CdizBedini:811873,
      author       = {Cádiz Bedini, Andrew P. and Muthmann, Stefan and Flohre,
                      Jan and Thiele, Björn and Willbold, Sabine and Carius,
                      Reinhard},
      title        = {{S}onophotolytically {S}ynthesized {S}ilicon
                      {N}anoparticle-{P}olymer {C}omposite {I}nk from a
                      {C}ommercially {A}vailable {L}ower {S}ilane},
      journal      = {Macromolecular chemistry and physics},
      volume       = {217},
      number       = {15},
      issn         = {1022-1352},
      address      = {Weinheim},
      publisher    = {Wiley-VCH},
      reportid     = {FZJ-2016-04215},
      pages        = {1655 - 1660},
      year         = {2016},
      abstract     = {The preparation of a printable silicon ink using
                      semiconductor grade and commercially available trisilane
                      (Si3H8) is reported. The synthesis is carried out in
                      solution at room temperature or below in N2 atmosphere at
                      ambient pressure and involves an initial sonication step,
                      followed by irradiation with ultraviolet light. The
                      production of higher order silanes via ultrasound using gas
                      chromatography is demonstrated and nuclear magnetic
                      resonance measurements are used to show that a combined
                      sonophotolytic treatment yields a highly branched silicon
                      hydride polymer. In addition, scanning electron microscopy
                      (SEM) images are used to ascertain the sonocatalytic
                      production of silicon nanoparticles. Furthermore, it is
                      argued that these particles are partially responsible for
                      enabling dramatically accelerated polymer growth, not
                      otherwise observed in the same amount of time using
                      ultraviolet light alone. Finally, the utility of the ink
                      used in this study is demonstrated for the field of
                      printable electronics by fabricating amorphous silicon thin
                      films by spin-coating and atmospheric pressure chemical
                      vapor deposition with optoelectronic properties approaching
                      those of state-of-the-art plasma enhanced chemical vapor
                      deposition (PECVD) material},
      cin          = {IEK-5 / IBG-2 / ZEA-3},
      ddc          = {540},
      cid          = {I:(DE-Juel1)IEK-5-20101013 / I:(DE-Juel1)IBG-2-20101118 /
                      I:(DE-Juel1)ZEA-3-20090406},
      pnm          = {121 - Solar cells of the next generation (POF3-121) / 582 -
                      Plant Science (POF3-582) / HITEC - Helmholtz
                      Interdisciplinary Doctoral Training in Energy and Climate
                      Research (HITEC) (HITEC-20170406)},
      pid          = {G:(DE-HGF)POF3-121 / G:(DE-HGF)POF3-582 /
                      G:(DE-Juel1)HITEC-20170406},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000382964300001},
      doi          = {10.1002/macp.201600005},
      url          = {https://juser.fz-juelich.de/record/811873},
}