% IMPORTANT: The following is UTF-8 encoded. This means that in the presence
% of non-ASCII characters, it will not work with BibTeX 0.99 or older.
% Instead, you should use an up-to-date BibTeX implementation like “bibtex8” or
% “biber”.
@ARTICLE{Xie:818240,
author = {Xie, Jie and Oudenhoven, Jos. F. M. and Dongjiang, Li and
Chunguang, Chen and Eichel, Rüdiger-A. and Notten, Peter H.
L.},
title = {{H}igh {P}ower and {H}igh {C}apacity 3{D}-{S}tructured
{T}i{O}2 {E}lectrodes for{L}ithium-{I}on {M}icrobatteries},
journal = {Journal of the Electrochemical Society},
volume = {163},
number = {10},
issn = {0013-4651},
address = {Pennington, NJ},
publisher = {Electrochemical Soc.},
reportid = {FZJ-2016-04718},
pages = {A2385-A2389},
year = {2016},
abstract = {An on-chip compatible method to fabricate high energy
density TiO2 thin film electrodes on 3D-structured silicon
substrates was demonstrated. 3D-structured electrodes are
fabricated by combining reactive ion etching (RIE) with low
pressure chemical vapor deposition (LPCVD), enabling
accurate control of the aspect ratio of substrates and the
subsequent deposition of TiO2 thin film electrodes onto
these structured substrates. The prepared 3D-TiO2 electrodes
exhibit a current-dependent increase in storage capacity of
a factor up to 16 as compared to conventional planar
electrodes. In addition, these 3D electrodes also reveal
excellent power and cycling performance. This work
demonstrates that LPCVD is capable of depositing homogeneous
film electrodes on highly structured substrates and the
prepared 3D-electrodes also shows significant improve in
storage capacity and power density.},
cin = {IEK-9},
ddc = {540},
cid = {I:(DE-Juel1)IEK-9-20110218},
pnm = {131 - Electrochemical Storage (POF3-131)},
pid = {G:(DE-HGF)POF3-131},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000389150900037},
doi = {10.1149/2.1141610jes},
url = {https://juser.fz-juelich.de/record/818240},
}