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@ARTICLE{Taoka:825881,
author = {Taoka, Noriyuki and Capellini, Giovanni and von den
Driesch, Nils and Buca, Dan Mihai and Zaumseil, Peter and
Schubert, Markus Andreas and Klesse, Wolfgang Matthias and
Montanari, Michele and Schroeder, Thomas},
title = {{S}n migration control at high temperature due to high
deposition speed for forming high-quality {G}e{S}n layer},
journal = {Applied physics express},
volume = {9},
number = {3},
issn = {1882-0786},
address = {Tokyo},
reportid = {FZJ-2017-00163},
pages = {031201},
year = {2016},
abstract = {A key factor for controlling Sn migration during GeSn
deposition at a high temperature of 400 °C was
investigated. Calculated results with a simple model for the
Sn migration and experimental results clarified that
low-deposition-speed (vd) deposition with vd's of 0.68 and
2.8 nm/min induces significant Sn precipitation, whereas
high-deposition-speed (vd = 13 nm/min) deposition leads to
high crystallinity and good photoluminescence spectrum of
the GeSn layer. These results indicate that vd is a key
parameter, and that control of Sn migration at a high
temperature is possible. These results are of great
relevance for the application of high-quality Sn-based
alloys in future optoelectronics devices.},
cin = {PGI-9 / JARA-FIT},
ddc = {530},
cid = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$},
pnm = {521 - Controlling Electron Charge-Based Phenomena
(POF3-521)},
pid = {G:(DE-HGF)POF3-521},
typ = {PUB:(DE-HGF)16},
UT = {WOS:000371302600004},
doi = {10.7567/APEX.9.031201},
url = {https://juser.fz-juelich.de/record/825881},
}