000825950 001__ 825950 000825950 005__ 20240619091225.0 000825950 0247_ $$2doi$$a10.1016/j.carbon.2016.05.058 000825950 0247_ $$2ISSN$$a0008-6223 000825950 0247_ $$2ISSN$$a1873-3891 000825950 0247_ $$2WOS$$aWOS:000380803600038 000825950 037__ $$aFZJ-2017-00222 000825950 082__ $$a540 000825950 1001_ $$0P:(DE-Juel1)159559$$aKireev, D.$$b0$$ufzj 000825950 245__ $$aHigh throughput transfer technique: Save your graphene 000825950 260__ $$aAmsterdam [u.a.]$$bElsevier Science$$c2016 000825950 3367_ $$2DRIVER$$aarticle 000825950 3367_ $$2DataCite$$aOutput Types/Journal article 000825950 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article$$bjournal$$mjournal$$s1484045331_19271 000825950 3367_ $$2BibTeX$$aARTICLE 000825950 3367_ $$2ORCID$$aJOURNAL_ARTICLE 000825950 3367_ $$00$$2EndNote$$aJournal Article 000825950 520__ $$aThe development rate of graphene-related research is tremendous. New methods of graphene growth and transfer are reported on a regular basis, trending towards large-scale. Nevertheless, the fabrication of high-yield and low-cost graphene devices is still challenging. In this work, we approach this problem from a technological point of view and propose a new, so-called “high-throughput transfer technique”. The technique allows a semi-automatic transfer of graphene films right at the desired places on a wafer. We demonstrate the applicability of our method by aligning 52 graphene devices on a 4-inch wafer using only 4 cm2 of graphene. 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