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| Home > Publications database > High throughput transfer technique: Save your graphene > print |
| 001 | 825950 | ||
| 005 | 20240619091225.0 | ||
| 024 | 7 | _ | |a 10.1016/j.carbon.2016.05.058 |2 doi |
| 024 | 7 | _ | |a 0008-6223 |2 ISSN |
| 024 | 7 | _ | |a 1873-3891 |2 ISSN |
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| 100 | 1 | _ | |a Kireev, D. |0 P:(DE-Juel1)159559 |b 0 |u fzj |
| 245 | _ | _ | |a High throughput transfer technique: Save your graphene |
| 260 | _ | _ | |a Amsterdam [u.a.] |c 2016 |b Elsevier Science |
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| 520 | _ | _ | |a The development rate of graphene-related research is tremendous. New methods of graphene growth and transfer are reported on a regular basis, trending towards large-scale. Nevertheless, the fabrication of high-yield and low-cost graphene devices is still challenging. In this work, we approach this problem from a technological point of view and propose a new, so-called “high-throughput transfer technique”. The technique allows a semi-automatic transfer of graphene films right at the desired places on a wafer. We demonstrate the applicability of our method by aligning 52 graphene devices on a 4-inch wafer using only 4 cm2 of graphene. The overall yield of this process is over 90%. |
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| 700 | 1 | _ | |a Sarik, Dario |0 P:(DE-Juel1)166454 |b 1 |
| 700 | 1 | _ | |a Wu, T. |0 P:(DE-HGF)0 |b 2 |
| 700 | 1 | _ | |a Xie, X. |0 P:(DE-HGF)0 |b 3 |
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| 700 | 1 | _ | |a Offenhäusser, A. |0 P:(DE-Juel1)128713 |b 5 |e Corresponding author |
| 773 | _ | _ | |a 10.1016/j.carbon.2016.05.058 |g Vol. 107, p. 319 - 324 |0 PERI:(DE-600)2014715-6 |p 319 - 324 |t Carbon |v 107 |y 2016 |x 0008-6223 |
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