Contribution to a conference proceedings FZJ-2017-00562

http://join2-wiki.gsi.de/foswiki/pub/Main/Artwork/join2_logo100x88.png
A 2D axisymmetric dynamic drift-diffusion model for numerical simulation of resistive switching phenomena in metal oxides

 ;  ;

2016
IEEE

2016 International Conference on Simulation of Semiconductor Processes and Devices (SISPAD), NurembergNuremberg, Germany, 6 Sep 2016 - 8 Sep 20162016-09-062016-09-08 IEEE 145 pp. () [10.1109/SISPAD.2016.7605168]

This record in other databases:

Please use a persistent id in citations: doi:

Abstract: We present a 2D axisymmetric model to simulate nonisothermal electronic-ionic transport in resistive-switching metal-oxide-metal structures, taking into account the effect of contact potential barriers. The model is applied to study the reset process in terms of the dynamic equilibrium between ionic drift and diffusion and of the physical parameters influencing this equilibrium. Furthermore, it is shown to capture the typical abrupt set and gradual reset behavior occurring during quasi-static voltage sweeps. Analyses of the filament evolution during the voltage sweep are performed to characterize the resulting resistance states.


Note: ISBN 978-1-5090-0818-6

Contributing Institute(s):
  1. Elektronische Materialien (PGI-7)
Research Program(s):
  1. 521 - Controlling Electron Charge-Based Phenomena (POF3-521) (POF3-521)

Appears in the scientific report 2016
Database coverage:
No Authors Fulltext
Click to display QR Code for this record

The record appears in these collections:
Document types > Events > Contributions to a conference proceedings
Institute Collections > PGI > PGI-7
Workflow collections > Public records
Publications database

 Record created 2017-01-17, last modified 2021-01-29


Restricted:
Download fulltext PDF Download fulltext PDF (PDFA)
Rate this document:

Rate this document:
1
2
3
 
(Not yet reviewed)