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@INPROCEEDINGS{Hardtdegen:826463,
author = {Hardtdegen, Alexander and La Torre, Camilla and Zhang, Hehe
and Funck, Carsten and Menzel, Stephan and Waser, Rainer and
Hoffmann-Eifert, Susanne},
title = {{I}nternal {C}ell {R}esistance as the {O}rigin of {A}brupt
{R}eset {B}ehavior in {H}f{O}2-{B}ased {D}evices
{D}etermined from {C}urrent {C}ompliance {S}eries},
reportid = {FZJ-2017-00688},
year = {2016},
abstract = {The resistive switching behavior in different HfO2/TiO2
nano crossbar structures of 100 x 100 nm2 size is analyzed
by means of DC voltage sweeps. The devices fabricated from 3
nm thin ALD layers of HfO2 and TiO2 sandwiched between Pt
and Hf or Ti electrodes show VCM-type bipolar resistive
switching after electroforming. For increased compliance
current (cc) during set from 50 μA to 800 μA, the set
current runs into self- limitation while the reset behavior
changes from gradual to abrupt. A model is defined with an
internal resistance being in series with the local resistive
switch. A recursive algorithm is applied to the cc series
for calculation of the series resistor and evaluation of the
intrinsic switching characteristic of HfO2-based cells. The
intrinsic LRS turns out to be current compliance controlled
and to follow the universal switching rule. Supported by
compact modelling, we show that an abrupt reset behavior
might arise even for materials with a gradual intrinsic
reset characteristic in consequence of an internal series
resistor.},
month = {May},
date = {2016-05-15},
organization = {2016 IEEE International Memory
Workshop (IMW), Paris (France), 15 May
2016 - 18 May 2016},
subtyp = {Other},
cin = {PGI-7 / PGI-10 / JARA-FIT},
cid = {I:(DE-Juel1)PGI-7-20110106 / I:(DE-Juel1)PGI-10-20170113 /
$I:(DE-82)080009_20140620$},
pnm = {524 - Controlling Collective States (POF3-524)},
pid = {G:(DE-HGF)POF3-524},
typ = {PUB:(DE-HGF)6},
doi = {10.1109/IMW.2016.7495280},
url = {https://juser.fz-juelich.de/record/826463},
}