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000827196 0247_ $$2doi$$a10.1002/9783527808465.EMC2016.5721
000827196 037__ $$aFZJ-2017-01394
000827196 041__ $$aEnglish
000827196 1001_ $$0P:(DE-HGF)0$$aMafakheri, Erfan$$b0
000827196 1112_ $$a16th European Microscopy Congress (EMC 2016)$$cLyon$$d2016-08-28 - 2016-09-02$$wFrance
000827196 245__ $$aElectron beam lithography for the realization of electron beam vortices with large topological charge ( L=1000ħ)
000827196 260__ $$aWeinheim, Germany$$bWiley-VCH Verlag GmbH & Co. KGaA$$c2016
000827196 29510 $$aEuropean Microscopy Congress 2016: Proceedings
000827196 300__ $$a390 - 391
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000827196 520__ $$aElectron vortex beams (EVBs) are an appealing topic, both in fundamental science and for practical applications in electron microscopy [1, 2]. Some of the most promising applications require beams that have large orbital angular momentum (OAM) [2, 3, 4]. Here, we demonstrate the largest (L=1000 ħ) high quality EVB by using electron beam lithography (EBL) to fabricate a phase hologram. EBL provides superior fabrication quality and a larger number of addressable points when compared with focused ion beam (FIB) milling. We measure the OAM of the generated EVB through propagation after a hard aperture cut [5]. Comparisons with simulations confirm an average OAM of (960±120)ħ , which is consistent with the intended value.A clear improvement when compared with a FIB-nanofabricated hologram is demonstrated in terms of 1) the maximum OAM that can be reached; 2) the minimum feature size (33 nm in the present study); 3) the improved uniformity of the frequency response; 4) the better suppression of higher order diffraction due to a nearly perfect rectangular groove profile.We believe that EBL will be the fabrication technique of choice for most new diffractive optics with electrons in the future, permitting more complex holograms and new applications in material science.
000827196 536__ $$0G:(DE-HGF)POF3-143$$a143 - Controlling Configuration-Based Phenomena (POF3-143)$$cPOF3-143$$fPOF III$$x0
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000827196 7001_ $$0P:(DE-Juel1)157886$$aTavabi, Amir Hossein$$b1
000827196 7001_ $$0P:(DE-Juel1)167381$$aLu, Penghan$$b2
000827196 7001_ $$0P:(DE-HGF)0$$aBalboni, Roberto$$b3
000827196 7001_ $$0P:(DE-HGF)0$$aVenturi, Federico$$b4
000827196 7001_ $$0P:(DE-HGF)0$$aMenozzi, Claudia$$b5
000827196 7001_ $$0P:(DE-HGF)0$$aGazzadi, Gian Carlo$$b6
000827196 7001_ $$0P:(DE-HGF)0$$aFrabboni, Stefano$$b7
000827196 7001_ $$0P:(DE-HGF)0$$aBoyd, Robert$$b8
000827196 7001_ $$0P:(DE-Juel1)144121$$aDunin-Borkowski, Rafal$$b9
000827196 7001_ $$0P:(DE-HGF)0$$aKarimi, Ebrahim$$b10
000827196 7001_ $$0P:(DE-HGF)0$$aGrillo, Vincenzo$$b11$$eCorresponding author
000827196 773__ $$a10.1002/9783527808465.EMC2016.5721
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