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@INPROCEEDINGS{Mafakheri:827196,
      author       = {Mafakheri, Erfan and Tavabi, Amir Hossein and Lu, Penghan
                      and Balboni, Roberto and Venturi, Federico and Menozzi,
                      Claudia and Gazzadi, Gian Carlo and Frabboni, Stefano and
                      Boyd, Robert and Dunin-Borkowski, Rafal and Karimi, Ebrahim
                      and Grillo, Vincenzo},
      title        = {{E}lectron beam lithography for the realization of electron
                      beam vortices with large topological charge ( {L}=1000ħ)},
      address      = {Weinheim, Germany},
      publisher    = {Wiley-VCH Verlag GmbH $\&$ Co. KGaA},
      reportid     = {FZJ-2017-01394},
      pages        = {390 - 391},
      year         = {2016},
      comment      = {European Microscopy Congress 2016: Proceedings},
      booktitle     = {European Microscopy Congress 2016:
                       Proceedings},
      abstract     = {Electron vortex beams (EVBs) are an appealing topic, both
                      in fundamental science and for practical applications in
                      electron microscopy [1, 2]. Some of the most promising
                      applications require beams that have large orbital angular
                      momentum (OAM) [2, 3, 4]. Here, we demonstrate the largest
                      (L=1000 ħ) high quality EVB by using electron beam
                      lithography (EBL) to fabricate a phase hologram. EBL
                      provides superior fabrication quality and a larger number of
                      addressable points when compared with focused ion beam (FIB)
                      milling. We measure the OAM of the generated EVB through
                      propagation after a hard aperture cut [5]. Comparisons with
                      simulations confirm an average OAM of (960±120)ħ , which
                      is consistent with the intended value.A clear improvement
                      when compared with a FIB-nanofabricated hologram is
                      demonstrated in terms of 1) the maximum OAM that can be
                      reached; 2) the minimum feature size (33 nm in the present
                      study); 3) the improved uniformity of the frequency
                      response; 4) the better suppression of higher order
                      diffraction due to a nearly perfect rectangular groove
                      profile.We believe that EBL will be the fabrication
                      technique of choice for most new diffractive optics with
                      electrons in the future, permitting more complex holograms
                      and new applications in material science.},
      month         = {Aug},
      date          = {2016-08-28},
      organization  = {16th European Microscopy Congress (EMC
                       2016), Lyon (France), 28 Aug 2016 - 2
                       Sep 2016},
      cin          = {PGI-5 / ER-C-1},
      cid          = {I:(DE-Juel1)PGI-5-20110106 / I:(DE-Juel1)ER-C-1-20170209},
      pnm          = {143 - Controlling Configuration-Based Phenomena (POF3-143)},
      pid          = {G:(DE-HGF)POF3-143},
      typ          = {PUB:(DE-HGF)8 / PUB:(DE-HGF)7},
      doi          = {10.1002/9783527808465.EMC2016.5721},
      url          = {https://juser.fz-juelich.de/record/827196},
}