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@PHDTHESIS{Cai:828405,
author = {Cai, Biya},
title = {{M}anipulating the {S}tructural and
{E}lectronic{P}roperties of {E}pitaxial {N}a{N}b{O}$_{3}$
{F}ilms via {S}trainand {S}toichiometry},
volume = {136},
school = {Universität Köln},
type = {Dr.},
address = {Jülich},
publisher = {Forschungszentrum Jülich GmbH Zentralbibliothek, Verlag},
reportid = {FZJ-2017-02366},
isbn = {978-3-95806-185-9},
series = {Schriften des Forschungszentrums Jülich. Reihe
Schlüsseltechnologien / Key Technologies},
pages = {VI, 114 S.},
year = {2016},
note = {Universität Köln, Diss., 2016},
abstract = {Due to their intriguing dielectric, pyroelectric,
elasto-electric, or opto-electric properties, oxide
ferroelectrics are vital candidates for the fabrication of
most electronics. However, these extraordinary properties
exist mainly in the temperature regime around the
ferroelectric phase transition, which is usually several
hundreds of K away from room temperature. Therefore, the
manipulation of oxide ferroelectrics, especially moving the
ferroelectric transition towards room temperature, is of
great interest for application and also basic research. In
this thesis, we demonstrate this using examples of
NaNbO$_{3}$ films. We show that the transition temperature
of these films can be modified via plastic strain caused by
epitaxial film growth on a structurally mismatched
substrate, and this strain can be fixed by controlling the
stoichiometry. The structural and electronic properties of
Na$_{1+x}$NbO$_{3+δ}$ thin films are carefully examined
byamong others XRD (e.g. RSM) and TEM and cryoelectronic
measurements. Especially the electronic features are
carefully analyzed via specially developed interdigitated
electrodes in combination with integrated temperature sensor
and heater. The electronic data are interpreted using
existing as well as novel theories and models, they are
proved to be closely correlated to the structural
characteristics. The major results are:-
Na$_{1+x}$NbO$_{3+δ}$ thin films can be grown epitaxially
on (110)NdGaO$_{3}$ with a thickness up to 140nm (thicker
films have not been studied). Plastic relaxation of the
compressive strain sets in when the thickness of the film
exceeds approximately 10 – 15 nm. Films with excess Na are
mainly composed of NaNbO$_{3}$ with minor contribution of
Na$_{3}$NbO$_{4}$. The latter phase seems to form
nanoprecipitates that are homogeneously distributed in the
NaNbO$_{3}$ film which helps to stabilize the film and
reduce the relaxation of the strain. - For the nominally
stoichiometric films, the compressive strain leads to a
broad and frequency-dispersive phase transition at lower
temperature (125 – 147 K). This could be either a new
transition or a shift in temperature of a known transition.
Considering the broadness and frequency dispersion of the
transition, this is actually a transition from the
dielectric state at high temperature to a relaxor-type
ferroelectric state at low temperature. The latter is based
on the formation of polar nano-regions (PNRs). Using the
electric field dependence of the freezing temperature,
allows a direct estimation of the volume (70 to270 nm$^{3}$)
and diameter (5.2 to 8 nm, spherical approximation) of the
PNRs. The values confirm with literature values which were
measured by other technologies. [...]},
cin = {PGI-8 / ICS-8},
cid = {I:(DE-Juel1)PGI-8-20110106 / I:(DE-Juel1)ICS-8-20110106},
pnm = {899 - ohne Topic (POF3-899)},
pid = {G:(DE-HGF)POF3-899},
typ = {PUB:(DE-HGF)3 / PUB:(DE-HGF)11},
urn = {urn:nbn:de:0001-2017032812},
url = {https://juser.fz-juelich.de/record/828405},
}