TY  - JOUR
AU  - Verbiest, G. J.
AU  - Stampfer, Christoph
AU  - Huber, S. E.
AU  - Andersen, M.
AU  - Reuter, K.
TI  - Interplay between nanometer-scale strain variations and externally applied strain in graphene
JO  - Physical review / B
VL  - 93
IS  - 19
SN  - 2469-9950
CY  - Woodbury, NY
PB  - Inst.
M1  - FZJ-2017-02573
SP  - 195438
PY  - 2016
AB  - We present a molecular modeling study analyzing nanometer-scale strain variations in graphene as a function of externally applied tensile strain. We consider two different mechanisms that could underlie nanometer-scale strain variations: static perturbations from lattice imperfections of an underlying substrate and thermal fluctuations. For both cases we observe a decrease in the out-of-plane atomic displacements with increasing strain, which is accompanied by an increase in the in-plane displacements. Reflecting the nonlinear elastic properties of graphene, both trends together yield a nonmonotonic variation of the total displacements with increasing tensile strain. This variation allows us to test the role of nanometer-scale strain variations in limiting the carrier mobility of high-quality graphene samples.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000376637700004
DO  - DOI:10.1103/PhysRevB.93.195438
UR  - https://juser.fz-juelich.de/record/828681
ER  -