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000830114 1001_ $$0P:(DE-HGF)0$$aMenéndez, Enric$$b0$$eCorresponding author
000830114 245__ $$aLateral Magnetically Modulated Multilayers by Combining Ion Implantation and Lithography
000830114 260__ $$aWeinheim$$bWiley-VCH$$c2017
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000830114 520__ $$aThe combination of lithography and ion implantation is demonstrated to be a suitable method to prepare lateral multilayers. A laterally, compositionally, and magnetically modulated microscale pattern consisting of alternating Co (1.6 µm wide) and Co-CoO (2.4 µm wide) lines has been obtained by oxygen ion implantation into a lithographically masked Au-sandwiched Co thin film. Magnetoresistance along the lines (i.e., current and applied magnetic field are parallel to the lines) reveals an effective positive giant magnetoresistance (GMR) behavior at room temperature. Conversely, anisotropic magnetoresistance and GMR contributions are distinguished at low temperature (i.e., 10 K) since the O-implanted areas become exchange coupled. This planar GMR is principally ascribed to the spatial modulation of coercivity in a spring-magnet-type configuration, which results in 180° Néel extrinsic domain walls at the Co/Co-CoO interfaces. The versatility, in terms of pattern size, morphology, and composition adjustment, of this method offers a unique route to fabricate planar systems for, among others, spintronic research and applications.
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000830114 7001_ $$0P:(DE-HGF)0$$aModarresi, Hiwa$$b1
000830114 7001_ $$0P:(DE-HGF)0$$aPetermann, Claire$$b2
000830114 7001_ $$0P:(DE-HGF)0$$aNogués, Josep$$b3$$eCorresponding author
000830114 7001_ $$0P:(DE-HGF)0$$aDomingo, Neus$$b4
000830114 7001_ $$0P:(DE-HGF)0$$aLiu, Haoliang$$b5
000830114 7001_ $$0P:(DE-HGF)0$$aKirby, Brian J.$$b6
000830114 7001_ $$0P:(DE-Juel1)159309$$aSyed Mohd, Amir$$b7$$ufzj
000830114 7001_ $$0P:(DE-Juel1)144963$$aSalhi, Zahir$$b8
000830114 7001_ $$0P:(DE-Juel1)130516$$aBabcock, Earl$$b9
000830114 7001_ $$0P:(DE-Juel1)130821$$aMattauch, Stefan$$b10
000830114 7001_ $$0P:(DE-HGF)0$$aVan Haesendonck, Chris$$b11
000830114 7001_ $$0P:(DE-HGF)0$$aVantomme, André$$b12
000830114 7001_ $$0P:(DE-HGF)0$$aTemst, Kristiaan$$b13$$eCorresponding author
000830114 773__ $$0PERI:(DE-600)2168935-0$$a10.1002/smll.201603465$$gVol. 13, no. 11, p. 1603465 -$$n11$$p1603465 -$$tSmall$$v13$$x1613-6810$$y2017
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