TY  - JOUR
AU  - Menéndez, Enric
AU  - Modarresi, Hiwa
AU  - Petermann, Claire
AU  - Nogués, Josep
AU  - Domingo, Neus
AU  - Liu, Haoliang
AU  - Kirby, Brian J.
AU  - Syed Mohd, Amir
AU  - Salhi, Zahir
AU  - Babcock, Earl
AU  - Mattauch, Stefan
AU  - Van Haesendonck, Chris
AU  - Vantomme, André
AU  - Temst, Kristiaan
TI  - Lateral Magnetically Modulated Multilayers by Combining Ion Implantation and Lithography
JO  - Small
VL  - 13
IS  - 11
SN  - 1613-6810
CY  - Weinheim
PB  - Wiley-VCH
M1  - FZJ-2017-03697
SP  - 1603465 -
PY  - 2017
AB  - The combination of lithography and ion implantation is demonstrated to be a suitable method to prepare lateral multilayers. A laterally, compositionally, and magnetically modulated microscale pattern consisting of alternating Co (1.6 µm wide) and Co-CoO (2.4 µm wide) lines has been obtained by oxygen ion implantation into a lithographically masked Au-sandwiched Co thin film. Magnetoresistance along the lines (i.e., current and applied magnetic field are parallel to the lines) reveals an effective positive giant magnetoresistance (GMR) behavior at room temperature. Conversely, anisotropic magnetoresistance and GMR contributions are distinguished at low temperature (i.e., 10 K) since the O-implanted areas become exchange coupled. This planar GMR is principally ascribed to the spatial modulation of coercivity in a spring-magnet-type configuration, which results in 180° Néel extrinsic domain walls at the Co/Co-CoO interfaces. The versatility, in terms of pattern size, morphology, and composition adjustment, of this method offers a unique route to fabricate planar systems for, among others, spintronic research and applications.
LB  - PUB:(DE-HGF)16
UR  - <Go to ISI:>//WOS:000397703600013
DO  - DOI:10.1002/smll.201603465
UR  - https://juser.fz-juelich.de/record/830114
ER  -