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@ARTICLE{Menndez:830114,
      author       = {Menéndez, Enric and Modarresi, Hiwa and Petermann, Claire
                      and Nogués, Josep and Domingo, Neus and Liu, Haoliang and
                      Kirby, Brian J. and Syed Mohd, Amir and Salhi, Zahir and
                      Babcock, Earl and Mattauch, Stefan and Van Haesendonck,
                      Chris and Vantomme, André and Temst, Kristiaan},
      title        = {{L}ateral {M}agnetically {M}odulated {M}ultilayers by
                      {C}ombining {I}on {I}mplantation and {L}ithography},
      journal      = {Small},
      volume       = {13},
      number       = {11},
      issn         = {1613-6810},
      address      = {Weinheim},
      publisher    = {Wiley-VCH},
      reportid     = {FZJ-2017-03697},
      pages        = {1603465 -},
      year         = {2017},
      abstract     = {The combination of lithography and ion implantation is
                      demonstrated to be a suitable method to prepare lateral
                      multilayers. A laterally, compositionally, and magnetically
                      modulated microscale pattern consisting of alternating Co
                      (1.6 µm wide) and Co-CoO (2.4 µm wide) lines has been
                      obtained by oxygen ion implantation into a lithographically
                      masked Au-sandwiched Co thin film. Magnetoresistance along
                      the lines (i.e., current and applied magnetic field are
                      parallel to the lines) reveals an effective positive giant
                      magnetoresistance (GMR) behavior at room temperature.
                      Conversely, anisotropic magnetoresistance and GMR
                      contributions are distinguished at low temperature (i.e., 10
                      K) since the O-implanted areas become exchange coupled. This
                      planar GMR is principally ascribed to the spatial modulation
                      of coercivity in a spring-magnet-type configuration, which
                      results in 180° Néel extrinsic domain walls at the
                      Co/Co-CoO interfaces. The versatility, in terms of pattern
                      size, morphology, and composition adjustment, of this method
                      offers a unique route to fabricate planar systems for, among
                      others, spintronic research and applications.},
      cin          = {JCNS (München) ; Jülich Centre for Neutron Science JCNS
                      (München) ; JCNS-FRM-II / Neutronenstreuung ; JCNS-1 /
                      JCNS-2},
      ddc          = {540},
      cid          = {I:(DE-Juel1)JCNS-FRM-II-20110218 /
                      I:(DE-Juel1)JCNS-1-20110106 / I:(DE-Juel1)JCNS-2-20110106},
      pnm          = {6G15 - FRM II / MLZ (POF3-6G15) / 6G4 - Jülich Centre for
                      Neutron Research (JCNS) (POF3-623)},
      pid          = {G:(DE-HGF)POF3-6G15 / G:(DE-HGF)POF3-6G4},
      experiment   = {EXP:(DE-MLZ)MARIA-20140101},
      typ          = {PUB:(DE-HGF)16},
      UT           = {WOS:000397703600013},
      doi          = {10.1002/smll.201603465},
      url          = {https://juser.fz-juelich.de/record/830114},
}