000830205 001__ 830205
000830205 005__ 20210129230440.0
000830205 037__ $$aFZJ-2017-03779
000830205 1001_ $$0P:(DE-Juel1)161247$$avon den Driesch, Nils$$b0$$eCorresponding author
000830205 1112_ $$a9th International Conference on Silicon Epitaxy and Heterostructures$$cMontréal$$d2015-05-17 - 2015-05-22$$gICSI 9$$wCanada
000830205 245__ $$aThick GeSn alloys for mid IR lasing applications
000830205 260__ $$c2015
000830205 3367_ $$033$$2EndNote$$aConference Paper
000830205 3367_ $$2DataCite$$aOther
000830205 3367_ $$2BibTeX$$aINPROCEEDINGS
000830205 3367_ $$2DRIVER$$aconferenceObject
000830205 3367_ $$2ORCID$$aLECTURE_SPEECH
000830205 3367_ $$0PUB:(DE-HGF)6$$2PUB:(DE-HGF)$$aConference Presentation$$bconf$$mconf$$s1496058493_25763$$xAfter Call
000830205 536__ $$0G:(DE-HGF)POF3-521$$a521 - Controlling Electron Charge-Based Phenomena (POF3-521)$$cPOF3-521$$fPOF III$$x0
000830205 7001_ $$0P:(DE-HGF)0$$aWirths, Stephan$$b1
000830205 7001_ $$0P:(DE-Juel1)161180$$aStange, Daniela$$b2
000830205 7001_ $$0P:(DE-HGF)0$$aStoica, Toma$$b3
000830205 7001_ $$0P:(DE-Juel1)128639$$aTiedemann, Andreas$$b4
000830205 7001_ $$0P:(DE-HGF)0$$aIkonic, Zoran$$b5
000830205 7001_ $$0P:(DE-HGF)0$$aHartmann, Jean-Michel$$b6
000830205 7001_ $$0P:(DE-Juel1)128617$$aMussler, Gregor$$b7
000830205 7001_ $$0P:(DE-Juel1)125588$$aGrützmacher, Detlev$$b8
000830205 7001_ $$0P:(DE-Juel1)128609$$aMantl, Siegfried$$b9
000830205 7001_ $$0P:(DE-Juel1)125569$$aBuca, Dan Mihai$$b10
000830205 909CO $$ooai:juser.fz-juelich.de:830205$$pVDB
000830205 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)161247$$aForschungszentrum Jülich$$b0$$kFZJ
000830205 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)138778$$aForschungszentrum Jülich$$b1$$kFZJ
000830205 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)161180$$aForschungszentrum Jülich$$b2$$kFZJ
000830205 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)128637$$aForschungszentrum Jülich$$b3$$kFZJ
000830205 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)128639$$aForschungszentrum Jülich$$b4$$kFZJ
000830205 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)128617$$aForschungszentrum Jülich$$b7$$kFZJ
000830205 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)125588$$aForschungszentrum Jülich$$b8$$kFZJ
000830205 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)128609$$aForschungszentrum Jülich$$b9$$kFZJ
000830205 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)125569$$aForschungszentrum Jülich$$b10$$kFZJ
000830205 9131_ $$0G:(DE-HGF)POF3-521$$1G:(DE-HGF)POF3-520$$2G:(DE-HGF)POF3-500$$3G:(DE-HGF)POF3$$4G:(DE-HGF)POF$$aDE-HGF$$bKey Technologies$$lFuture Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT)$$vControlling Electron Charge-Based Phenomena$$x0
000830205 920__ $$lyes
000830205 9201_ $$0I:(DE-Juel1)PGI-9-20110106$$kPGI-9$$lHalbleiter-Nanoelektronik$$x0
000830205 9201_ $$0I:(DE-82)080009_20140620$$kJARA-FIT$$lJARA-FIT$$x1
000830205 980__ $$aconf
000830205 980__ $$aVDB
000830205 980__ $$aI:(DE-Juel1)PGI-9-20110106
000830205 980__ $$aI:(DE-82)080009_20140620
000830205 980__ $$aUNRESTRICTED