% IMPORTANT: The following is UTF-8 encoded.  This means that in the presence
% of non-ASCII characters, it will not work with BibTeX 0.99 or older.
% Instead, you should use an up-to-date BibTeX implementation like “bibtex8” or
% “biber”.

@INPROCEEDINGS{vondenDriesch:830205,
      author       = {von den Driesch, Nils and Wirths, Stephan and Stange,
                      Daniela and Stoica, Toma and Tiedemann, Andreas and Ikonic,
                      Zoran and Hartmann, Jean-Michel and Mussler, Gregor and
                      Grützmacher, Detlev and Mantl, Siegfried and Buca, Dan
                      Mihai},
      title        = {{T}hick {G}e{S}n alloys for mid {IR} lasing applications},
      reportid     = {FZJ-2017-03779},
      year         = {2015},
      month         = {May},
      date          = {2015-05-17},
      organization  = {9th International Conference on
                       Silicon Epitaxy and Heterostructures,
                       Montréal (Canada), 17 May 2015 - 22
                       May 2015},
      subtyp        = {After Call},
      cin          = {PGI-9 / JARA-FIT},
      cid          = {I:(DE-Juel1)PGI-9-20110106 / $I:(DE-82)080009_20140620$},
      pnm          = {521 - Controlling Electron Charge-Based Phenomena
                      (POF3-521)},
      pid          = {G:(DE-HGF)POF3-521},
      typ          = {PUB:(DE-HGF)6},
      url          = {https://juser.fz-juelich.de/record/830205},
}