000830329 001__ 830329
000830329 005__ 20210129230504.0
000830329 0247_ $$2doi$$a10.1063/1.4984117
000830329 0247_ $$2ISSN$$a0021-8979
000830329 0247_ $$2ISSN$$a0148-6349
000830329 0247_ $$2ISSN$$a1089-7550
000830329 0247_ $$2WOS$$aWOS:000404164200029
000830329 0247_ $$2Handle$$a2128/16841
000830329 037__ $$aFZJ-2017-03896
000830329 082__ $$a530
000830329 1001_ $$0P:(DE-Juel1)161530$$aSchulte-Braucks, Christian$$b0$$eCorresponding author
000830329 245__ $$aSchottky barrier tuning via dopant segregation in NiGeSn-GeSn contacts
000830329 260__ $$aMelville, NY$$bAmerican Inst. of Physics$$c2017
000830329 3367_ $$2DRIVER$$aarticle
000830329 3367_ $$2DataCite$$aOutput Types/Journal article
000830329 3367_ $$0PUB:(DE-HGF)16$$2PUB:(DE-HGF)$$aJournal Article$$bjournal$$mjournal$$s1496394595_2203
000830329 3367_ $$2BibTeX$$aARTICLE
000830329 3367_ $$2ORCID$$aJOURNAL_ARTICLE
000830329 3367_ $$00$$2EndNote$$aJournal Article
000830329 520__ $$aWe present a comprehensive study on the formation and tuning of the Schottky barrier of NiGeSn metallic alloys on Ge1-xSnx semiconductors. First, the Ni metallization of GeSn is investigated for a wide range of Sn contents (x = 0–0.125). Structural analysis reveals the existence of different poly-crystalline NiGeSn and Ni3(GeSn)5 phases depending on the Sn content. Electrical measurements confirm a low NiGeSn sheet resistance of 12 Ω/□ almost independent of the Sn content. We extracted from Schottky barrier height measurements in NiGeSn/GeSn/NiGeSn metal-semiconductor-metal diodes Schottky barriers for the holes below 0.15 eV. They decrease with the Sn content, thereby confirming NiGeSn as an ideal metal alloy for p-type contacts. Dopant segregation for both p- and n-type dopants is investigated as a technique to effectively modify the Schottky barrier of NiGeSn/GeSn contacts. Secondary ion mass spectroscopy is employed to analyze dopant segregation and reveal its dependence on both the Sn content and biaxial layer strain.
000830329 536__ $$0G:(DE-HGF)POF3-521$$a521 - Controlling Electron Charge-Based Phenomena (POF3-521)$$cPOF3-521$$fPOF III$$x0
000830329 536__ $$0G:(EU-Grant)619509$$aE2SWITCH - Energy Efficient Tunnel FET Switches and Circuits (619509)$$c619509$$fFP7-ICT-2013-11$$x1
000830329 588__ $$aDataset connected to CrossRef
000830329 7001_ $$0P:(DE-HGF)0$$aHofmann, Emily$$b1
000830329 7001_ $$0P:(DE-Juel1)165997$$aGlass, Stefan$$b2
000830329 7001_ $$0P:(DE-Juel1)161247$$avon den Driesch, Nils$$b3
000830329 7001_ $$0P:(DE-Juel1)128617$$aMussler, Gregor$$b4
000830329 7001_ $$0P:(DE-Juel1)133840$$aBreuer, Uwe$$b5
000830329 7001_ $$0P:(DE-HGF)0$$aHartmann, Jean-Michel$$b6
000830329 7001_ $$0P:(DE-HGF)0$$aZaumseil, Peter$$b7
000830329 7001_ $$0P:(DE-HGF)0$$aSchröder, Thomas$$b8
000830329 7001_ $$0P:(DE-Juel1)128649$$aZhao, Qing-Tai$$b9
000830329 7001_ $$0P:(DE-Juel1)128609$$aMantl, Siegfried$$b10
000830329 7001_ $$0P:(DE-Juel1)125569$$aBuca, Dan$$b11
000830329 773__ $$0PERI:(DE-600)1476463-5$$a10.1063/1.4984117$$gVol. 121, no. 20, p. 205705 -$$n20$$p205705 -$$tJournal of applied physics$$v121$$x1089-7550$$y2017
000830329 8564_ $$uhttps://juser.fz-juelich.de/record/830329/files/1.4984117.pdf$$yPublished on 2017-05-31. Available in OpenAccess from 2018-05-31.
000830329 8564_ $$uhttps://juser.fz-juelich.de/record/830329/files/1.4984117.gif?subformat=icon$$xicon$$yPublished on 2017-05-31. Available in OpenAccess from 2018-05-31.
000830329 8564_ $$uhttps://juser.fz-juelich.de/record/830329/files/1.4984117.jpg?subformat=icon-180$$xicon-180$$yPublished on 2017-05-31. Available in OpenAccess from 2018-05-31.
000830329 8564_ $$uhttps://juser.fz-juelich.de/record/830329/files/1.4984117.jpg?subformat=icon-700$$xicon-700$$yPublished on 2017-05-31. Available in OpenAccess from 2018-05-31.
000830329 8564_ $$uhttps://juser.fz-juelich.de/record/830329/files/1.4984117.pdf?subformat=pdfa$$xpdfa$$yPublished on 2017-05-31. Available in OpenAccess from 2018-05-31.
000830329 909CO $$ooai:juser.fz-juelich.de:830329$$pdnbdelivery$$pec_fundedresources$$pVDB$$pdriver$$popen_access$$popenaire
000830329 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)161530$$aForschungszentrum Jülich$$b0$$kFZJ
000830329 9101_ $$0I:(DE-588b)5008462-8$$60000-0002-1826-5280$$aForschungszentrum Jülich$$b1$$kFZJ
000830329 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)165997$$aForschungszentrum Jülich$$b2$$kFZJ
000830329 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)161247$$aForschungszentrum Jülich$$b3$$kFZJ
000830329 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)128617$$aForschungszentrum Jülich$$b4$$kFZJ
000830329 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)133840$$aForschungszentrum Jülich$$b5$$kFZJ
000830329 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)128649$$aForschungszentrum Jülich$$b9$$kFZJ
000830329 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)128609$$aForschungszentrum Jülich$$b10$$kFZJ
000830329 9101_ $$0I:(DE-588b)5008462-8$$6P:(DE-Juel1)125569$$aForschungszentrum Jülich$$b11$$kFZJ
000830329 9131_ $$0G:(DE-HGF)POF3-521$$1G:(DE-HGF)POF3-520$$2G:(DE-HGF)POF3-500$$3G:(DE-HGF)POF3$$4G:(DE-HGF)POF$$aDE-HGF$$bKey Technologies$$lFuture Information Technology - Fundamentals, Novel Concepts and Energy Efficiency (FIT)$$vControlling Electron Charge-Based Phenomena$$x0
000830329 9141_ $$y2017
000830329 915__ $$0StatID:(DE-HGF)0200$$2StatID$$aDBCoverage$$bSCOPUS
000830329 915__ $$0StatID:(DE-HGF)0600$$2StatID$$aDBCoverage$$bEbsco Academic Search
000830329 915__ $$0StatID:(DE-HGF)0530$$2StatID$$aEmbargoed OpenAccess
000830329 915__ $$0StatID:(DE-HGF)0100$$2StatID$$aJCR$$bJ APPL PHYS : 2015
000830329 915__ $$0StatID:(DE-HGF)0150$$2StatID$$aDBCoverage$$bWeb of Science Core Collection
000830329 915__ $$0StatID:(DE-HGF)0110$$2StatID$$aWoS$$bScience Citation Index
000830329 915__ $$0StatID:(DE-HGF)0111$$2StatID$$aWoS$$bScience Citation Index Expanded
000830329 915__ $$0StatID:(DE-HGF)9900$$2StatID$$aIF < 5
000830329 915__ $$0StatID:(DE-HGF)0030$$2StatID$$aPeer Review$$bASC
000830329 915__ $$0StatID:(DE-HGF)1150$$2StatID$$aDBCoverage$$bCurrent Contents - Physical, Chemical and Earth Sciences
000830329 915__ $$0StatID:(DE-HGF)0300$$2StatID$$aDBCoverage$$bMedline
000830329 915__ $$0StatID:(DE-HGF)0420$$2StatID$$aNationallizenz
000830329 915__ $$0StatID:(DE-HGF)0199$$2StatID$$aDBCoverage$$bThomson Reuters Master Journal List
000830329 920__ $$lyes
000830329 9201_ $$0I:(DE-Juel1)PGI-9-20110106$$kPGI-9$$lHalbleiter-Nanoelektronik$$x0
000830329 9201_ $$0I:(DE-Juel1)ZEA-3-20090406$$kZEA-3$$lAnalytik$$x1
000830329 980__ $$ajournal
000830329 980__ $$aVDB
000830329 980__ $$aUNRESTRICTED
000830329 980__ $$aI:(DE-Juel1)PGI-9-20110106
000830329 980__ $$aI:(DE-Juel1)ZEA-3-20090406
000830329 9801_ $$aFullTexts